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The purpose of this paper is to investigate the effect of annealing on photochromic performance of (E)‐dicyclopropylmethylene‐(2, 5‐dimethyl‐3‐furylethylid‐ene)‐succinicanhydride doped in polyacrylic acid thin film.

(E)‐dicyclopropylmethylene‐(2,5‐dimethyl‐3‐furyl‐ethylidene)‐succinic‐anhydride (DMDFS‐E) fulgide doped in polyacrylic acid thin films was prepared. DMDFS‐E fulgide doped in polyacrylic acid thin films was heated at various annealing temperatures. Photocoloration, photobleaching and photochemical fatigue resistance for the desired DMDFS‐E fulgide doped in polyacrylic acid thin films were studied.

Upon irradiation with UV light (366 nm), fulgide DMDFS‐E undergoes a conrotatory ring closure to the pinkish colored closed form C (523 nm). The later color was switched back to the original color when the films were irradiated with white light. The kinetics of photocoloration and photobleaching processes were followed spectrophotometrically by monitoring the absorbance of the ring closed product DMDFS‐C at its λmax of 523 nm. The first‐order plots of photocoloration reaction showed distinct linear line at different temperatures. The slope of these first‐order lines corresponding to the rate constants k. It was found that for photocoloration reaction, the rate constant of the photocoloration reaction was slower than the photobleaching reaction and both reactions decrease with increasing the annealing temperatures. It was found that there was almost improvement of photochemical fatigue resistance of fulgide DMDFS‐E doped in polyacrylic acid thin film at several of the annealing temperatures.

The results obtained in this work showed that the photochromic properties of DMDFS fulgide E were improved upon annealing the film at 100°C. Therefore, it would be recommended for improvement to apply fulgides as annealed polymer films.

The purpose of this paper is to evaluate the photochromic performance of photochromic compounds in polymer matrices.

The polystyrene films doped with photochromic fulgide were prepared and the effect of UV irradiation were studied using spectrophotometer. The reversible reaction was effected using white light. The effect of heat was also determined.

A film of the green coloured fulgide 2‐E doped in polystyrene polymer was irradiated with UV light (366 nm), the film turned blue. The latter colour was partially switched back to the original green colour when the film was irradiated with a white light. Increasing the annealing temperatures, increases the percentage conversion of 2‐C to 2‐E. The observed large bathochromic shifts in λ_max of 2‐C and the partial conversion of 2‐C to 2‐E were rationalised on the bases of electronic and steric effects. It was found that both isomers 2‐C and 2‐E absorbed white light and they interconvert. The kinetics of photocoloration and photobleaching processes were followed spectrophotometrically by monitoring the absorbance of the ring closed product 2‐C at its λ_max of 620 nm. The apparent first‐order rate constants for both processes were determined. It was found that there was slight variation in the rate constant for photocoloration reaction with annealing temperature. On the other hand, the apparent first‐order rate constant of the photobleaching reaction decreases with increasing the annealing temperature.

The polystyrene polymer doped photochromic fulgides described in the present paper was prepared and studied. The principle of study established can be applied to any type of polymer or to any type of photochromic compounds.

The photochromic materials developed can be used for different applications, such as coatings and holography.

The method developed may be used to enhance the performance of photochromic materials.

Major trends in the PWB industry and the requirements from the manufacturers to reduce reject rates at the imaging and chemical process stages have demanded a new generation of dry film photoresists. Details are given of the requirements laid down by the industry, how the dry film resist manufacturers have responded, and how the improved resist technology meets these demands. These latest products are extensively available in Europe and resist improvements have been welcomed by the board manufacturers.