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The effect of materials and design on the reliability of through-glass vias for 2.5 D integrated circuits: a numerical study

Omar Ahmed (Materials Science and Engineering, University of Central Florida, Orlando, Florida, USA)
Chukwudi Okoro (Department of Mechanics and Reliability Sciences, Corning Inc, Corning, New York, USA)
Scott Pollard (Department of Integration Technologies, Corning Inc, Corning, New York, USA)
Tengfei Jiang (Materials Science and Engineering, University of Central Florida, Orlando, Florida, USA)

Multidiscipline Modeling in Materials and Structures

ISSN: 1573-6105

Article publication date: 24 October 2020

Issue publication date: 4 February 2021

171

Abstract

Purpose

This study aims to investigate the factors responsible for substrate cracking reliability problem in through-glass vias (TGVs), which are critical components for glass-based 2.5 D integration.

Design/methodology/approach

Numerical models were used to examine the driving force for substrate cracking in glass interposers due to stress coupling during heating. An analytical solution was used to demonstrate how the energy release rate (ERR) for the glass substrate cracking is affected by the via design and the mismatch in thermal strain. Then, the numerical models were implemented to investigate the design factors effects, such as the pitch distance, via diameter, via pattern, via design, effect from a stress buffer layer and the interposer materials selection on the susceptibility to substrate cracking.

Findings

ERR for substrate cracking was found to be directly proportional to the via diameter and the thermal mismatch strain. When a via pattern is implemented for high-density integration, a coupling in the stress fields was identified. This coupling effect was found to depend on the pitch distance, the position of the vias, and the via arrangement, suggesting a via pattern-dependent reliability behavior for glass interposers. Changing the design of the via to an annular shape or a substrate-cored via was found to be a promising approach to reduce the susceptibility to substrate cracking compared to a fully filled solid via. Also, the use of a stress buffer layer, an encouraging design prospect presented for the first time for TGVs in this study, was found to significantly reduce cracking. Finally, alternative via and substrate materials showed lower tendency for substrate cracking, indicating that the reliability of glass interposers can be further enhanced with the implementation of such new materials.

Originality/value

This study signifies the first attempt to comprehensively evaluate the susceptibility to crack formation in glass interposers during heating. Therefore, this study provides new perspectives on how to achieve a significant potential reliability improvement for TGVs.

Keywords

Acknowledgements

This work is supported in part by the NSF I/UCRC on Multi-functional Integrated System Technology (MIST) Center IIP-1439644, IIP-1439680, and IIP-1738752.

Citation

Ahmed, O., Okoro, C., Pollard, S. and Jiang, T. (2021), "The effect of materials and design on the reliability of through-glass vias for 2.5 D integrated circuits: a numerical study", Multidiscipline Modeling in Materials and Structures, Vol. 17 No. 2, pp. 451-464. https://doi.org/10.1108/MMMS-05-2020-0125

Publisher

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Emerald Publishing Limited

Copyright © 2020, Emerald Publishing Limited

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