DuPont Fluoroproducts introduces new permeation resistant grade Teflon® PFA HP Plus flouropolymer resin

Pigment & Resin Technology

ISSN: 0369-9420

Article publication date: 1 December 2004

Keywords

Citation

(2004), "DuPont Fluoroproducts introduces new permeation resistant grade Teflon® PFA HP Plus flouropolymer resin", Pigment & Resin Technology, Vol. 33 No. 6. https://doi.org/10.1108/prt.2004.12933fad.013

Publisher

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Emerald Group Publishing Limited

Copyright © 2004, Emerald Group Publishing Limited


DuPont Fluoroproducts introduces new permeation resistant grade Teflon® PFA HP Plus flouropolymer resin

DuPont Fluoroproducts introduces new permeation resistant grade Teflon® PFA HP Plus flouropolymer resin

Keywords: DuPont Fluoroproducts, Resins, Coatings technology

DuPont Fluoroproducts has announced it is introducing a new grade of permeation resistant DuPont™ Teflon® PFA HP Plus in North America, following a successful launch in Asia last fall. The new resin, Teflon® PFA 951HP Plus, is designed for molding and extrusion for fluid handling components and tubing, and cuts hydrochloric acid (HCl) permeation by up to 40 percent to ensure durability and longer life, lowering the cost of equipment ownership for semiconductor manufacturers. This is the latest in the Teflon® HP Plus line of polymers from DuPont Fluoroproducts, which offer high purity, chemical resistance and mechanical properties ideally suited to semiconductor manufacturing environments.

“What is so unique about this product is that it’s a patented innovation that controls permeation to an extremely high degree, which is increasingly critical as chip manufacturers move from aluminum to copper materials”, said Mike Cardona, North America Semicon marketing manager. “This enables long-lasting, reliable operation of equipment even in today’s most demanding fluid handling environments, especially those involving HCl. We are pleased to introduce Teflon® PFA 951HP Plus in North America at Semicon West. It’s another example of how DuPont is applying science and technology to advanced semiconductor materials.”