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A New Generation Multilayer System: Low Cost and High Reliability

T. Gilles (W. C. Heraeus GmbH, Hanau, W. Germany)
Q. Reynolds (W. C. Heraeus GmbH, Hanau, W. Germany Heraeus Silica and Metals, Byfleet, Surrey, England)
J. Steinberg (W. C. Heraeus GmbH, Hanau, W. Germany Heraeus Cermalloy Inc., W. Conshohocken, Pennsylvania, USA)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 January 1990

38

Abstract

The increasing complexity of hybrid circuits has led to a need for a reliable multilayer system. As well as reliability, the manufacturer will, of course, also attach considerable importance to material and production costs. Until now, thick film multilayer applications have been limited by the inability of existing technology to reduce their susceptibility to galvanic effects occurring between individual conductive layers during fabrication. Now, however, this company has developed a multilayer dielectric which prevents metal migration. The system is supported by conductor and resistor systems.

Citation

Gilles, T., Reynolds, Q. and Steinberg, J. (1990), "A New Generation Multilayer System: Low Cost and High Reliability", Microelectronics International, Vol. 7 No. 1, pp. 24-27. https://doi.org/10.1108/eb044398

Publisher

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MCB UP Ltd

Copyright © 1990, MCB UP Limited

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