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Thick‐film Resistor as a Heater

J. Kozłowski (Institute of Electron Technology, Technical University, Wrocław, Poland)
A. Dziedzic (Institute of Electron Technology, Technical University, Wrocław, Poland)
K. Nitsch (Institute of Electron Technology, Technical University, Wrocław, Poland)
R.F. Szeloch (Institute of Electron Technology, Technical University, Wrocław, Poland)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 January 1987

48

Abstract

This paper presents the thermal behaviour of the thick‐film resistor. Continuous and pulse power heating were supplied. The maximum non‐destroyed power was established and the maximum temperatures reached by the resistive layer were estimated for each method of heating.

Citation

Kozłowski, J., Dziedzic, A., Nitsch, K. and Szeloch, R.F. (1987), "Thick‐film Resistor as a Heater", Microelectronics International, Vol. 4 No. 1, pp. 46-48. https://doi.org/10.1108/eb044261

Publisher

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MCB UP Ltd

Copyright © 1987, MCB UP Limited

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