The purpose of this paper is to: analyze the changing properties of epitaxial layers, manufactured in the considered reactor, with the changing parameters of the growth taking into account native convection; and development of the most common analytical approach to describe the technological process.
In this paper a vertical reactor for gas phase epitaxy is considered that consists of an external casing, a keeper of substrate with a substrate and a spiral around the casing in area of the growth zone to generate induction heating in order to activate the chemical reactions in the decay of reagents and the growth of the epitaxial layer by using the reagents. The authors introduce an analytical approach to analyze nonlinear mass and heat transport with account variation in space and time parameters.
The authors find conditions to improve properties of epitaxial layers.
Growth regimes at atmospheric and low pressure have been compared and analyzed for their influence of the native convection on the growth of the epitaxial layers. Accounting for the calculated results, recommendations have been formulated to improve the properties of the epitaxial layers.
This work is supported by the agreement dated August 27, 2013 No 02.В.49.21.0003 between The Ministry of Education and Science of the Russian Federation and Lobachevsky State University of Nizhni Novgorod, an educational fellowship for scientific research of Government of Russian, an educational fellowship for scientific research of Government of Nizhny Novgorod region of Russia and an educational fellowship for scientific research of Nizhny Novgorod State University of Architecture and Civil Engineering.
Pankratov, E. and Bulaeva, E. (2016), "On optimization of growth from gas phase in a vertical reactor with account native convection to improve properties of films", Multidiscipline Modeling in Materials and Structures, Vol. 12 No. 4, pp. 712-725. https://doi.org/10.1108/MMMS-02-2016-0008Download as .RIS
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