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Analytical modeling for the estimation of leakage current and subthreshold swing factor of nanoscale double gate FinFET device

Balwinder Raj (Indian Institute of Technology, Roorkee, India)
A.K. Saxena (Indian Institute of Technology, Roorkee, India)
S. Dasgupta (Indian Institute of Technology, Roorkee, India)

Microelectronics International

ISSN: 1356-5362

Article publication date: 23 January 2009

824

Abstract

Purpose

The aim of this paper is to formulate the effect of the process variation on various leakage currents and subthreshold swing factor in FinFET devices. These variations cause a large spread in leakage power, since it is extremely sensitive to process variations, which in turn results in larger temperature variations across different dies.

Design/methodology/approach

Owing to large temperature variation within the die, the authors investigate the variation of various leakage currents with absolute die temperature.

Findings

The results obtained on the basis of the model are compared and contrasted with reported numerical and experimental results. A close match was found which validates the analytical approach.

Originality/value

The analytical modeling of subthreshold leakage current, subthreshold swing, gate leakage current and its variation with process parameters are carried out in this paper.

Keywords

Citation

Raj, B., Saxena, A.K. and Dasgupta, S. (2009), "Analytical modeling for the estimation of leakage current and subthreshold swing factor of nanoscale double gate FinFET device", Microelectronics International, Vol. 26 No. 1, pp. 53-63. https://doi.org/10.1108/13565360910923188

Publisher

:

Emerald Group Publishing Limited

Copyright © 2009, Emerald Group Publishing Limited

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