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Synthetic reaction of rosin‐modified phenolic resin for offset inks

Zhengqing Wang (East China University of Science & Technology, Shanghai, PRC.)
Piying Gao (East China University of Science & Technology, Shanghai, PRC.)
Pin Chen (East China University of Science & Technology, Shanghai, PRC.)

Pigment & Resin Technology

ISSN: 0369-9420

Article publication date: 1 April 2000

Abstract

The synthetic reaction of rosin‐modified phenolic resin used as a vehicle for offset inks was studied. The two‐step synthetic process to feed resol by dropping was adopted to control the formation of methylene quinone, which was derived from the dehydration of hydroxymethyl phenol. The methylene quinone could react with rosin and vegetable oil to form dibenzopyran cyclic product by Diels‐Alder reaction. The dibenzopyran cyclic product was favourable for raising the molecular weight and the mineral oil tolerance of the modified resin.

Keywords

Citation

Wang, Z., Gao, P. and Chen, P. (2000), "Synthetic reaction of rosin‐modified phenolic resin for offset inks", Pigment & Resin Technology, Vol. 29 No. 2, pp. 88-92. https://doi.org/10.1108/03699420010317834

Publisher

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MCB UP Ltd

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