Novel 4H‐SiC BJT utilizing floating buried layer in base for high current gain, high current gain stability and high breakdown voltage
ISSN: 0332-1649
Article publication date: 9 March 2010
Abstract
Purpose
The purpose of this paper is to present a novel structure of 4H‐SiC bipolar junction transistor (BJT) to realize high current gain, high current gain stability, and high breakdown voltage.
Design/methodology/approach
A novel structure of 4H‐SiC BJT with floating buried layer in the base epilayer is presented. The simulation and optimization are done using the TCAD tool.
Findings
This novel structure is increasing the current gain effectively, at the same time, the current gain stability and breakdown voltage are higher comparing with the conventional structure.
Originality/value
The paper proposes a new “4H‐SiC FBL‐BJT” with high current gain, high current gain stability and high breakdown voltage.
Keywords
Citation
Zhang, Y., Zhang, B., Li, Z., Deng, X. and Liu, X. (2010), "Novel 4H‐SiC BJT utilizing floating buried layer in base for high current gain, high current gain stability and high breakdown voltage", COMPEL - The international journal for computation and mathematics in electrical and electronic engineering, Vol. 29 No. 2, pp. 515-521. https://doi.org/10.1108/03321641011014977
Publisher
:Emerald Group Publishing Limited
Copyright © 2010, Emerald Group Publishing Limited