Laser days

Work Study

ISSN: 0043-8022

Article publication date: 1 September 2000

32

Citation

(2000), "Laser days", Work Study, Vol. 49 No. 5. https://doi.org/10.1108/ws.2000.07949eab.006

Publisher

:

Emerald Group Publishing Limited

Copyright © 2000, MCB UP Limited


Laser days

Cymer, Inc., the world's leading supplier of excimer laser illumination sources essential for deep ultraviolet (DUV) photolithography, has unveiled the latest addition to its advanced lithography light source portfolio - the ELS-6010. Operating at 2,500 Hz, the ELS-6010 is the world's highest repetition rate KrF production laser. Signalling Cymer's continued product leadership at the 248 nm wavelength, the ELS-6010 will be a key enabler in the production of next-generation devices with 130 nm (0.13 micron) and below design rules. Based on the leading-edge ELS-6000, the ELS-6010 is designed to provide full imaging capability for 200 mm and 300 mm lithography steppers and scanners with > 0.7 numerical aperture (NA) lens designs. The ELS-6010 delivers this higher level of spectral performance through a highly line-narrowed bandwidth of less than or equal to 0.5 pm at full-width half maximum (FWHM) and less than or equal to 1.4 pm at 95 per cent energy integral and provides a significant improvement in dose stability performance at less than or equal to ±0.35 per cent. The ELS-6010 incorporates numerous technological advances, including a new high voltage power supply, laser discharge chamber and wavelength stabilisation module to become the world's highest repetition rate production DUV laser. Compared to 2000 Hz lasers, the ELS-6010 2,500 Hz delivers 25 per cent more pulses in a single exposure, ultimately improving the energy dose stability at the wafer for improved critical dimension (CD) control and higher yield. Furthermore, with its improved thermal management, the ELS-6010 can deliver full 20-watt power at unlimited duty cycle. Further information on Cymer may be obtained from http://www.cymer.com

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