Keywords
Citation
(2000), "Shipley Company and Samsung Electronics", Circuit World, Vol. 26 No. 3. https://doi.org/10.1108/cw.2000.21726cab.024
Publisher
:Emerald Group Publishing Limited
Copyright © 2000, MCB UP Limited
Shipley Company and Samsung Electronics
Shipley Company and Samsung Electronics
Keywords: Shipley, Samsung, R&D, Partnering
Shipley Company and Samsung Electronics Company, Ltd. have launched a research and development partnership to speed development of a leading-edge lithography process for making faster, more powerful chips.
Under the multi-year agreement, the two companies will join forces to develop photoresists for the new 193 nanometer Argon Fluoride(ArF) lithography process. This leading-edge process enables chip manufacturers to print smaller features on semiconductor devices, thereby dramatically increasing the performance and storage capacity of each chip.
Shipley and Samsung are the first photoresist and semiconductor manufacturers, respectively, to join forces to develop this new technology. The partnership will give Samsung first access to the new photoresist products and allow Shipley to manufacture and market the jointly developed, licensed technology to the semiconductor industry .