Shipley Company and Samsung Electronics

Circuit World

ISSN: 0305-6120

Article publication date: 1 September 2000




(2000), "Shipley Company and Samsung Electronics", Circuit World, Vol. 26 No. 3.



Emerald Group Publishing Limited

Copyright © 2000, MCB UP Limited

Shipley Company and Samsung Electronics

Shipley Company and Samsung Electronics

Keywords: Shipley, Samsung, R&D, Partnering

Shipley Company and Samsung Electronics Company, Ltd. have launched a research and development partnership to speed development of a leading-edge lithography process for making faster, more powerful chips.

Under the multi-year agreement, the two companies will join forces to develop photoresists for the new 193 nanometer Argon Fluoride(ArF) lithography process. This leading-edge process enables chip manufacturers to print smaller features on semiconductor devices, thereby dramatically increasing the performance and storage capacity of each chip.

Shipley and Samsung are the first photoresist and semiconductor manufacturers, respectively, to join forces to develop this new technology. The partnership will give Samsung first access to the new photoresist products and allow Shipley to manufacture and market the jointly developed, licensed technology to the semiconductor industry .

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