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The purpose of this research is to develop an automatic optical inspection system for thin film transistor (TFT) liquid crystal display (LCD).

A new algorithm that accounts for the closing, opening, etching, dilating, and genetic method is used. It helps to calculate the location and rotation angle for transistor patterns precisely and quickly. The system can adjust inspection platform parameters according to viewed performance. The parameter adaptation occurs in parallel with running the genetic algorithm and imaging processing methods. The proposed method is compared with the algorithms that use artificial parameter sets.

This system ensures high quality in an LCD production line. This multipurpose image‐based measurement method uses unsophisticated and economical equipment, and it also detects defects in the micro‐fabrication process.

The experiment's results show that the proposed method offers advantages over other competing methods.