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This paper aims to present a flattening method for developing 2D basic patterns from 3D designed garments. The method incorporates the techniques of professional pattern development for the purpose of pattern‐making automation. The aims of the flattening method are to improve the dressing suitability and to produce pleasing figures by reversing design procedures.

A flattening method is presented in this paper for developing 3D undevelopable NURBS surfaces in 2D. The automatic operation embeds the expertise of pattern makers by reducing total area differences between the designed garments in 3D styles and the two‐dimensional patterns. Basic pattern‐making invokes the boundary constraints which apply mesh alignments techniques.

The global area difference between the original 3D designs and the 2D‐developed pattern is controlled within 5 percent in order to reach the final outcomes of basic patterns, whose shapes are similar to the drawing patterns currently utilized in the industry.

This study currently handles simple designs, such as basal designs, and can only flatten garments in symmetric styles. The direct flattening method is developed by this study. In addition, this study is supplemented by expert‐based knowledge, and it establishes basic boundary conditions for various garment patterns to increase the feasibility of flattening automation.

This study introduces the fundamental theories and methodologies used in the automatic making of basic patterns from 3D garment designs. It proposes a flattening method with pattern expertise embedded by real‐time approximations of the global area of the 3D undevelopable designs to the 2D patterns.

For reliable telecommunication systems, Bellcore recommends that Surface Insulation Resistance (SIR) be monitored at key points in printed wiring board and circuit pack manufacturing. The Bellcore SIR criteria are based on the old ‘Bell System’ test pattern having 0·025 inch conductor line widths, and 0·050 inch conductor spacings. Since divestiture, many equipment suppliers have suggested using different test patterns, or even conductors on actual product for SIR testing. Also, with the trend to high density packaging and smaller conductor spacings, the Bellcore pattern now represents old technology. This work confirms and advances prior work suggesting pattern translation based on the SIR per square concept. Essentially exact SIR per square correlation has been found over an order of magnitude of pattern conductor space widths. Critical experimental techniques to modify the FR‐4 epoxy surface appropriately and an important theoretical hypothesis involving shadowing (proven experimentally) are developed in this work.

Investigates patterns of consumption in society and choices therein, citing the literature – in particular the 1964‐74 period. Examines the ‘consumption pattern’ both colloquially and informally and the nature of consumption. Contends that such differences in the ways and means of satisfying needs in different consumption categories do indicate different consumption patterns. Looks at emerging consumption patterns in the USA and other advanced Western economies characterised by the private, individual and passive extremities of the dimensions and outlines these. Concludes that the issue of patterns of consumption is an important one, considering its impact on an individual's life – although consumption patterns are a major component of a consumer's life process as a whole.

Describes a PC‐based CAD system for producing made‐to‐measure garment patterns which has been developed and implemented in the commercial environment of a bridalwear manufacturer. The software simulates the hand drafting methods of the company while automating pattern production with the following benefits: first, very rapid production of made‐to measure patterns; second, production of patterns which require minimal alteration at first fitting; third, a user friendly interface with very short training period; fourth, the de‐skilling of the pattern cutting procedure so that problems of staff turnover and training are minimal; and fifth, the elimination of human error in pattern cutting. Initial software development concentrated on bodice patterns. Further enhancements included sleeves and skirts and the mixing and matching of these three components of a dress. Cutting layouts were produced using automatic layout algorithms so that the whole procedure from order and measurements entry through pattern drafting and lay‐planning to the final full scale plotting could be carried out automatically. Furthermore, a queuing system allowed several orders previously entered on the computer to be processed in succession without any intervention by an operator. All the company’s styles are now held by the computer, which is in constant use, to the exclusion of the previously used skilled and lengthy hand drafting methods.

The subtractive method is widely used to produce high‐density PWBs. It is generally accepted that a pattern pitch of 100 microns or less cannot be achieved by the subtractive method because of the thickness of the copper layer to be etched. We report here on experiments to investigate the relationship between the pattern pitch of a circuit formed by the subtractive method and the required thickness of the copper layer. We have also determined the allowable thickness of the copper layer, plating layer, and copper foil layer for achieving a pattern pitch of 100 microns (L/S = 50/50 microns) or less.

As an extended work of the previous paper (Sul, 2010), this paper provides a guideline information for an anonymous garment pattern in sewing process. The purpose of this paper is to first, provide garment pattern database. By simply taking pictures of garment patterns, the shape database is constructed. Once the shape database is prepared, data retrieval can be done by image indexing, i.e., simply inserting garment pattern boundary shape again to the database. Using shock graph methodology, the pattern sets used for database preparation can be exactly retrieved. Second, to find the nearest shape of a given input pattern shape in the database. If the input garment pattern shape does not exist in the database, the shape matching algorithm provides the next similar pattern data. The user, who is assumed to be non-expert in garment sewing process, can easily predict the position and combination information of various patterns.

Image processing is used to construct the garment pattern shape database. The boundary shapes are extracted from the photographs of garment patterns and their shape recognition information, especially shock graph, is also recorded for later pattern data retrieval.

Using the image processing technique, garment patterns can be converted to electronic format easily. Also the prepared pattern database can be used for finding the nearest shape of an additional given input garment pattern. Patterns with irregular shapes were retrieved easily, while those with a simple shape, such as rectangle, showed a little erroneous result.

Shape recognition has been adopted in various industrial areas, except for garment sewing process. Using the provided methodology, garment pattern shapes can be easily saved and retrieved only by taking pictures of them.

Statistical quality control charts cannot indicate explicitly whether there is any special disturbance in the manufacturing process. pattern recognition scheme can solve this problem. The simultaneous control of two or more variables is necessary when the quality of the product depends on the joint effect of these variables. Studies the combination patterns of random and random, shift and cycle, trend and cycle, and trend and shift for two variables. Proposes a T² control chart and uses simulation to determine pattern diagnostic characteristics for these combinations. The pattern diagnostic characteristics studied are window size, zone boundary, and zone representation. The results indicate that window size 20 is appropriate for these particular parameters, equal probability and the highest percentage alternative are adopted as the zone boundary and the zone representation, respectively. The sensitivity analysis of the pattern parameters indicates the pattern diagnostic is robust for changes in the parameter values.

The purpose of this paper is to develop an automated custom-pattern-making system using the width-height independent grading method for semi-customized clothing.

The system reads basic patterns and graded large patterns and calculates the grading ratio of independent horizontal and vertical values on all points in a pattern. The custom pattern is automatically generated by calculating the horizontal and vertical grading amount according to individual body measurements. The system does not follow any complicated alteration rules.

The width-height independent grading method can provide custom-pattern fitted primary body circumference and length and helps to quickly produce semi-customized clothing.

There are few studies on automated custom-pattern-making systems without an alteration rule. This study developed an automatic custom-pattern-making system using the width-height independent grading method.

Apparel pattern making is an age‐old occupation which is full of heuristics and unwritten rules. These rules have yet to be comprehensively studied for possible incorporation into apparel CAD systems. At present, most of these systems have drafting subsystems that address only a portion of this process. Explores pattern making in detail. Seeks to identify the motivations behind all its procedures and operations. A knowledge of such motivations provides a better understanding of the whole process. This knowledge can subsequently be used to design better computer‐aided pattern‐making systems.

The paper presents a method for the patterns simulation in the 3D virtual stitching and try-on system.

First, the patterns are designed using the garment CAD software and stored in the DXF format. Second, the regular grid method is employed to mesh the patterns to be quadrangular, and the patterns triangular meshing can be obtained by connecting the diagonal of the quadrangular. Then a mass-spring model is established, and the forces analysis and the explicit Euler integration method are employed to accomplish the patterns simulation. The paper demonstrates the robustness of our simulation through two sets of experiments, including a lady’s dress patterns meshing experiments and the experiments of the virtual stitching of the lady’s dress.

The patterns meshing algorithm can meet the requirements of the internal meshing and the boundary meshing, and it is very important to select an appropriate meshing density. The implementation of the virtual stitching of the lady’s dress proves the effectiveness and usability of the simulation methods.

The lady’s dress used in the experiments is a relatively simple fashion style, with only the front and back pattern. It is very worthy of further research on the effectiveness of the complex structure of clothing.

The paper includes practical implications of the methods of the patterns meshing and the virtual stitching of the simple fashion styles.

The simulation system is developed using VC++ 2015 with the help of the OpenGL functions library, which is proved as a simple, lower computation and robustness for the patterns simulation of the simple garments.