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The purpose of this study is to form fabrication and electrical characteristics of passive device embedded substrate that is embedded chip bead inductor and chip capacitor inside substrate for the application of radio frequency (RF) modules.

Passive device embedded substrate was fabricated using embedding process that consists of lamination process, laser drilling at the electrode Cu pads of passive components, electro-less Cu plating formation process such as photolithography, electrolytic Cu plating and etching. Impedance and capacitance characteristics of the fabricated passive device embedded substrate were evaluated.

By checking what embedded components are placed in the appropriate place using failure analysis via connection performance between copper plane and embedded components was verified. For measuring electrical characteristics of the fabricated passive device embedded substrate, the evaluation was done using test methods like continuity test for checking interconnections which are not connected to any embedded components and in-circuit test for checking interconnections which are connected to any embedded component. From in-circuit testing for embedding passive components with series and parallel circuits, the authors verified how to test passive device embedded substrate by using capacitance and impedance measurement with the comparison of measured results between good samples and bad samples.

Ultra miniaturized and low-profile mobile products are driving the need for embedded passive component integration technologies using a novel manufacturing-compatible organic substrate and interconnect technologies. Fabrication and test methods for passive device embedded substrate described in this paper are expected to lead to be developed to make quality measurable for the application of RF modules.

The purpose of this paper is to present the design and manufacture of embedded passive devices in organic substrates.

Low cost and high performance duplexers have been designed for WiMAX front‐end modules with multi‐layered organic substrates. Band‐pass filters (BPFs) and duplexers for the WiMAX FEM have been embedded in organic substrates. In addition, a new organic substrate manufacturing process has been proposed in order to improve the tolerance of embedded passives in organic substrates.

The overall size of FEM, which includes PA and bypass capacitor, is 5.4×4×1.5 mm. BPFs and duplexer show good electrical performances with low insertion loss and high attenuation. The dual‐band FEM with embedded passive components incorporates the duplexers including 2 and 5 GHz BPFs. The dimensions of BPFs and duplexer are 1.65×1.8×0.12 mm, 1.32×1.2×0.12 mm and 2×2×0.6 mm, respectively. The integrated dual‐band BPFs show an insertion loss < 1.8 dB in path band and 22‐40 dB attenuation performance in rejection band. The newly proposed fabrication process improves the tolerance for embedded capacitors in the organic substrate. This new process provides two main advantages. First, the flat coating process is not required. Second, it has a better copper pattern tolerance since the pattern is achieved with the addictive process. The tolerance of capacitances produced by the newly proposed process is compared with one manufactured by the conventional etching process. The newly proposed process provides a better capacitance tolerance.

In future studies, it is suggested that the tolerance study should include other variations such as thickness, alignment and material properties.

The paper's findings can be used for designing and manufacturing embedded passives devices for wireless applications.

This study shows a technology development in the area of embedded passive devices in organic substrates.

Embedded passives account for a very large part of today's electronic assemblies. This is particularly true for products such as cellular phones, camcorders, computers, and several critical defence devices. Market pressures for new products with more features, smaller size and lower cost demand smaller, compacter, simpler substrates. An obvious strategy is to reduce the number of surface mounted passives by embedding them in the substrate. In addition, current interconnect technology to accommodate surface mounted passives imposes certain limits on board design which constrain the overall system speed. Embedding passives is one way to minimize the functional footprint while at the same time improving performance. The purpose of this paper is to describe the development of a thin film technology based on ferroelectric‐epoxy polymer‐based flake‐free resin coated copper capacitive (RC3) nanocomposites to manufacture multilayer embedded capacitors.

This paper discusses thin film technology based on RC3 nanocomposites. In particular, recent developments in high capacitance, large area, thin film passives, and their integration in system in a package (SiP) are highlighted.

A variety of RC3 nanocomposite thin films ranging from 8 to 50 microns thick were processed on copper substrates by liquid coating. Multilayer embedded capacitors resulted in high capacitances of 16‐28 nF. The fabricated test vehicle also included two embedded resistor layers with resistances in the range of 15 Ω to 100 kΩ. To enable high performance devices, an embedded resistor must meet certain tolerances. The embedded resistors can be laser trimmed to a tolerance of <5 percent, which is usually acceptable for most applications. An extended embedded passives solution has been demonstrated, both through its high wireability designs and package performance, to be perfectly suited for SiP applications.

This case study designed and fabricated an eight layer high density internal passive core and subsequently applied fine geometry three buildup layers to form a 3‐8‐3 structure. The passive core technology is capable of providing up to six layers of embedded capacitance and could be extended further.

A thin film technology based on ferroelectric‐epoxy polymer‐based flake‐free RC3 nanocomposites was developed to manufacture multilayer embedded capacitors. The overall approach lends itself to package miniaturization because capacitance can be increased through multiple layers and reduced thickness to give the desired values in a smaller area.

The purpose of this paper is to present a hybrid manufacturing system that integrates stereolithography (SL) and direct print (DP) technologies to fabricate three‐dimensional (3D) structures with embedded electronic circuits. A detailed process was developed that enables fabrication of monolithic 3D packages with electronics without removal from the hybrid SL/DP machine during the process. Successful devices are demonstrated consisting of simple 555 timer circuits designed and fabricated in 2D (single layer of routing) and 3D (multiple layers of routing and component placement).

A hybrid SL/DP system was designed and developed using a 3D Systems SL 250/50 machine and an nScrypt micro‐dispensing pump integrated within the SL machine through orthogonally‐aligned linear translation stages. A corresponding manufacturing process was also developed using this system to fabricate 2D and 3D monolithic structures with embedded electronic circuits. The process involved part design, process planning, integrated manufacturing (including multiple starts and stops of both SL and DP and multiple intermediate processes), and post‐processing. SL provided substrate/mechanical structure manufacturing while interconnections were achieved using DP of conductive inks. Simple functional demonstrations involving 2D and 3D circuit designs were accomplished.

The 3D micro‐dispensing DP system provided control over conductive trace deposition and combined with the manufacturing flexibility of the SL machine enabled the fabrication of monolithic 3D electronic structures. To fabricate a 3D electronic device within the hybrid SL/DP machine, a process was developed that required multiple starts and stops of the SL process, removal of uncured resin from the SL substrate, insertion of active and passive electronic components, and DP and laser curing of the conductive traces. Using this process, the hybrid SL/DP technology was capable of successfully fabricating, without removal from the machine during fabrication, functional 2D and 3D 555 timer circuits packaged within SL substrates.

Results indicated that fabrication of 3D embedded electronic systems is possible using the hybrid SL/DP machine. A complete manufacturing process was developed to fabricate complex, monolithic 3D structures with electronics in a single set‐up, advancing the capabilities of additive manufacturing (AM) technologies. Although the process does not require removal of the structure from the machine during fabrication, many of the current sub‐processes are manual. As a result, further research and development on automation and optimization of many of the sub‐processes are required to enhance the overall manufacturing process.

A new methodology is presented for manufacturing non‐traditional electronic systems in arbitrary form, while achieving miniaturization and enabling rugged structure. Advanced applications are demonstrated using a semi‐automated approach to SL/DP integration. Opportunities exist to fully automate the hybrid SL/DP machine and optimize the manufacturing process for enhancing the commercial appeal for fabricating complex systems.

This work broadly demonstrates what can be achieved by integrating multiple AM technologies together for fabricating unique devices and more specifically demonstrates a hybrid SL/DP machine that can produce 3D monolithic structures with embedded electronics and printed interconnects.

With the advent of new materials and technologies that enable passive components to be embedded within electronic substrates, one key question that arises is: under what circumstances (and for what type of applications) is it economically viable to consider using embedded passives? The economic issues that must be considered consist of a combination of manufacturing costs and throughputs, and non‐manufacturing life cycle costs. This paper discusses the assessment of manufacturing costs associated with embedding resistors and capacitors in printed circuit boards and provides cost modeling results for an avionics board. The discussion is extended to include optimizing the specific embedded passive content in a board and design for production modeling when embedded passives are present. Life cycle cost issues are also qualitatively discussed.

There has been increasing interest in the development of printable electronics to meet the growing demand for low‐cost, large‐area, miniaturized, flexible and lightweight devices. The purpose of this paper is to discuss the electronic applications of novel printable materials.

The paper addresses the utilization of polymer nanocomposites as it relates to printable and flexible technology for electronic packaging. Printable technology such as screen‐printing, ink‐jet printing, and microcontact printing provides a fully additive, non‐contacting deposition method that is suitable for flexible production.

A variety of printable nanomaterials for electronic packaging have been developed. This includes nanocapacitors and resistors as embedded passives, nanolaser materials, optical materials, etc. Materials can provide high‐capacitance densities, ranging from 5 to 25 nF/in², depending on composition, particle size, and film thickness. The electrical properties of capacitors fabricated from BaTiO₃‐epoxy nanocomposites showed a stable dielectric constant and low loss over a frequency range from 1 to 1,000 MHz. A variety of printable discrete resistors with different sheet resistances, ranging from ohm to Mohm, processed on large panels (19.5×24 inches) have been fabricated. Low‐resistivity materials, with volume resistivity in the range of 10⁻⁴‐10⁻⁶ ohm cm, depending on composition, particle size, and loading, can be used as conductive joints for high‐frequency and high‐density interconnect applications. Thermosetting polymers modified with ceramics or organics can produce low k and lower loss dielectrics. Reliability of the materials was ascertained by (Infrared; IR‐reflow), thermal cycling, pressure cooker test (PCT) and solder shock testing. The change in capacitance after 3× IR‐reflow and after 1,000 cycles of deep thermal cycling between −55°C and +125°C was within 5 per cent. Most of the materials in the test vehicle were stable after IR‐reflow, PCT, and solder shock.

The electronic applications of printable, high‐performance nanocomposite materials such as adhesives (both conductive and non‐conductive), interlayer dielectrics (low‐k, low‐loss dielectrics), embedded passives (capacitors and resistors), and circuits, etc.. are discussed. Also addressed are investigations of printable optically/magnetically active nanocomposite and polymeric materials for fabrication of devices such as inductors, embedded lasers, and optical interconnects.

A thin film printable technology was developed to manufacture large‐area microelectronics with embedded passives, Z‐interconnects and optical waveguides, etc. The overall approach lends itself to package miniaturization because multiple materials and devices can be printed in the same layer to increase functionality.

The purpose of this paper is to investigate the basic functional parameters of passive embedded components in printed circuit boards (PCBs) under environmental exposures such as thermal-humidity and thermal exposure.

The investigations were based on the thin-film resistors made of NiP alloy, thick-film resistors made of carbon or carbon–silver inks, embedded capacitors made of FaradFlex materials and embedded inductor made in various configurations. The capacitors and thin- and thick-film resistors were tested in the climatic chamber in conditions of thermal-humidity exposure at 85°C and 85 per cent RH for 500 h. The embedded inductors were tested in two different environmental conditions: thermal-humidity exposure at 60°C and 95 per cent RH, and thermal exposure at 150°C and additionally at the temperature in the range of +25°C to +150°C.

Studies show that in the case of embedded capacitors, the changes caused by exposure to thermal-humidity are durable and lead to the capacity increase. The embedded thin-film resistors behave in the same manner, whereas the thick-film resistors were the least resistant to the conditions of exposure. Most of the polymer thick-film resistors have been damaged. The changes of coils' properties during aging are small, and what is most important is that, after some time of exposure, their parameters stabilize at a particular level. The changes resulting from the increase in temperature are typically related to the change of material resistance (Cu) of which coils are made, and as such, they cannot be avoided but they can be predicted.

The realized studies allowed determination of the properties of the embedded passive elements with respect to specific environmental exposures. The studies show that embedded resistors can be used interchangeably with chip passive elements. It allows saving the area on the surface of PCB, occupied by these passive elements, for assembly of active elements integrated circuits (ICs) and thus enabling the miniaturization of electronic devices.

The knowledge about the behavior of the operating parameters of embedded components, considering the environmental conditions, allows for development of more complex systems with integrated PCBs.

Nickel phosphorus (Ni−P) thin-films have been electrolessly deposited in an acid-plating bath with the addition of manganese sulfate monohydrate (MSM) to achieve higher resistance for the application of embedded resistor with value beyond 10 KΩ. As this material is being used for fabricating embedded resistors under the addition of MSM, its resistance properties including effects of MSM concentration and plating time on resistances, temperature coefficient of resistance (TCR), and resistance tolerance of embedded resistor were investigated. The paper aims to discuss these issues.

The structure of fabricated Ni−P film was detected by means of scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The properties of substrate, including the surface morphologies, glass transition process and boundary of copper pad and substrate surface, were performed by SEM, dynamic mechanical analysis and optical microscope, respectively. The resistance tolerances of embedded resistors were elaborated from the cases of Ni−P thin-film resistance tolerance and the size effects of resistors, respectively.

The fabricated film was found to be constructed with numerous Ni−P amorphous nanoparticles, which was believed to be the reason of increasing thin-film resistance. The Ni−P thin-films presented over one magnitude order of resistance increasing in the case of MSM concentration varied from 0 to 40 g/L. For the case of TCRs, Ni−P thin-films deposited with 20 g/L MSM exhibited low TCRs of within ±100 ppm/°C Before TR at temperature elevating from 40 to 160°C, indicating that this Ni−P thin-film belongs to the constant TCR materials according to the military standard. For the tolerance of embedded resistor, the tolerance contributed by Ni−P thin-film was obtained to be 9.8 percent, whereas the geometry tolerances were in the range of 0-20 percent according to the geometries of embedded resistor.

For Ni−P thin-film without MSM, its low resistance with around 100 ohm/sq. limit the values of resistor few KΩ and restricted its widespread application of embedded resistor with higher resistance beyond 10 KΩ. The authors introduced MnSO₄ in Ni−P electroless plating process to improve the low resistance of Ni−P thin-film. The resistance was increased over one order of magnitude after added with 40 g/L MnSO₄. Due to the specific structure, as this material is being used for fabricating embedded resistors, the electrical properties and its application properties to verify its appliance in embedded resistor were systematically investigated by means of SEM, TEM, XRD characterizations, TCRs, resistance tolerance analysis, respectively.