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This paper aims to provide an overview of the strategies and techniques being used and developed for the fabrication of nanoscale devices.

This paper discusses various nanofabrication technologies and strategies and highlights their merits and limitations. It concludes with a consideration of longer‐term possibilities.

It is shown that top‐down nanofabrication frequently uses lithographic and other techniques derived from the microtechnology industry but recent research appears to have identified a limit to its capabilities. Bottom‐up nanofabrication is less well‐developed but techniques such as molecular mechanosynthesis may offer unique capabilities in the longer‐term.

The paper provides a timely review of the rapidly developing field of nanofabrication technology.

The purpose of this paper is to simulate and analyze the excitation and propagation of surface plasmon polaritons (SPPs) on sinusoidal metallic gratings in conical mounting.

Chandezon's method has been implemented in MATLAB environment in order to compute the optical response of metallic gratings illuminated under azimuthal rotation. The code allows describing the full optical features both in far- and near-field terms, and the performed analyses highlight the fundamental role of incident polarization on SPP excitation in the conical configuration.

Results of far-field polarization conversion and plasmonic near-field computation clearly show that azimuthally rotated metallic gratings can support propagating surface plasmon with generic polarization.

The recent papers experimentally demonstrated the benefits in sensitivity and the polarization phenomenology that are originated by an azimuthal rotation of the grating. In this work, numerical simulations confirm these experimental results and complete the analysis with a study of the excited SPP near-field on the metal surface.

The purpose of this paper is to create a textile material which shows antibacterial activity with resistance to environmental conditions by using volatile active agent inclusion complex and self-assembly method.

An inclusion complex of carvacrol and β-CD is generated by kneading method and deposited on the cotton fabrics by using a nanofabrication method named as layer-by-layer (LbL) deposition method. Three different concentration of CD and CD:Car aqueous solutions were deposited on cotton fabrics. Attenuated total reflectance Fourier transform infrared spectroscopy (FTIR-ATR), scanning electron microscopy (SEM), antimicrobial efficacy test of fabrics against washing and some physical tests (water vapor permeability, air permeability) were performed on the fabrics before and after the treatment with CD to evaluate the effect of the LbL process on cotton fabric properties.

The results showed that the coated fabrics with CD/CD:Car multilayer films enhanced the antimicrobial efficacy of cotton fabrics against to Klebsiella pneumonia and Staphylococus aureus bacteria. Air and water vapor permeability properties of the cotton fabric effected after the LbL deposition process sure enough. With SEM and FTIR-ATR analysis the CD:Car complex presence were verified. The durability of antibacterial properties were analyzed after one and ten washing (40°C and 30 min) cycles.

This work provides a novel and simple method for CD and inclusion complex of carvacrol film deposition by self-assembly method on cotton fabrics and their application onto cotton fabrics to gain antibacterial property.

The purpose of this paper is to share valuable information about low‐cost microwave circuit research with academic and industrial communities that work, or want to work, in this field.

Screen‐printing technology has been chosen as the fabrication method because of simplicity and low costs. Different materials and printing parameters were tested in four generations of microstrip lines. After obtaining a satisfactory fabrication method, passive microwave components were printed, assembled, characterized and modeled.

Results demonstrated that the proposed low‐cost method allows fabricating low loss microstrip lines (15.63×10⁻³ dB/mm at 10 GHz), filters, inductors, and capacitors that work well up to 12 GHz.

Model accuracy of inductors and capacitors can be improved. The use of more precise calibration and de‐embedding techniques is necessary. More components can be fabricated and modeled to increase the flexibility and applicability of the proposed fabrication method.

The presented information can help limited budget companies and small educational institutions in electronics to fabricate microwave circuits at low costs. This is an excellent approach for students who want to learn how to make microwave frequency measurements and circuits without the need of expensive fabrication equipment and clean rooms.

The step‐by‐step fabrication method described in this paper allows fabricating different microwave components at low costs. The presentation of electrical models for each component completes the design‐fabrication cycle. As this information is gathered in a single source, it makes easier the incursion of new actors in the microwave field.

The purpose of this study is to present reports on fabrication of silicon (Si) nanowires (NWs). The study consists of microwire formation on silicon-on-insulator (SOI) that was fabricated using a top-down approach which involved conventional photolithography coupled with shallow anisotropic etching.

A 5-inch p-type silicon-on-insulator (SOI) coated with 250nm layer and Photoresist (PR) with thickness of 400nm is coated in order to make pattern transfer via binary mask, after the exposure and development, a resist pattern between 3 μm-5 μm were obtained, Oxygen plasma spreen was used to reduce the size of the PR to 800 μm, after this, the wafer with 800 μm was loaded into SAMCO inductively coupled plasma (ICP)-RIE and got silicoon microwire was obtained. Next, the sample was put into an oxidation furnace for 15, 30, 45 and 60 minutes and the sample was removed and dipped into a buffered oxide etch solution for five minutes to remove all the SiO₂ ashes.

The morphological characterization was conducted using scanning electron microscopy and atomic force microscopy. At terminal two, gold electrodes which were designated as source and drain were fabricated on top of individual NWs using conventional lithography electrical and chemical response. Once the trimming process has been completed, the device's current–voltage (I-V) characteristic was measured by using a Keithley 4200 semiconductor parameter analyser. Devices with different width of wires approximately 20, 40, 60 and 80 nm were characterized. The wire current variation as a function of the pH variation in voltage was investigated: pH monitoring for variations of pH values between 5 and 9.

This paper provides useful information on novel and yet simple cost-effective fabrication of SiNW; as such, it should be of interest to a broad readership, especially those interested in micro/nanofabrication.