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Article
Publication date: 27 September 2011

Robert Bogue

This paper aims to provide an overview of the strategies and techniques being used and developed for the fabrication of nanoscale devices.

Abstract

Purpose

This paper aims to provide an overview of the strategies and techniques being used and developed for the fabrication of nanoscale devices.

Design/methodology/approach

This paper discusses various nanofabrication technologies and strategies and highlights their merits and limitations. It concludes with a consideration of longer‐term possibilities.

Findings

It is shown that top‐down nanofabrication frequently uses lithographic and other techniques derived from the microtechnology industry but recent research appears to have identified a limit to its capabilities. Bottom‐up nanofabrication is less well‐developed but techniques such as molecular mechanosynthesis may offer unique capabilities in the longer‐term.

Originality/value

The paper provides a timely review of the rapidly developing field of nanofabrication technology.

Content available
Article
Publication date: 31 July 2007

Abstract

Details

Microelectronics International, vol. 24 no. 3
Type: Research Article
ISSN: 1356-5362

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Article
Publication date: 22 May 2007

Abstract

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Circuit World, vol. 33 no. 2
Type: Research Article
ISSN: 0305-6120

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Article
Publication date: 1 March 1999

B.H. Rudall

Abstract

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Kybernetes, vol. 28 no. 2
Type: Research Article
ISSN: 0368-492X

Keywords

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Article
Publication date: 3 August 2010

Abstract

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Assembly Automation, vol. 30 no. 3
Type: Research Article
ISSN: 0144-5154

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Article
Publication date: 28 June 2011

Abstract

Details

Sensor Review, vol. 31 no. 3
Type: Research Article
ISSN: 0260-2288

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Article
Publication date: 11 November 2013

Gianluca Ruffato and Filippo Romanato

– The purpose of this paper is to simulate and analyze the excitation and propagation of surface plasmon polaritons (SPPs) on sinusoidal metallic gratings in conical mounting.

Abstract

Purpose

The purpose of this paper is to simulate and analyze the excitation and propagation of surface plasmon polaritons (SPPs) on sinusoidal metallic gratings in conical mounting.

Design/methodology/approach

Chandezon's method has been implemented in MATLAB environment in order to compute the optical response of metallic gratings illuminated under azimuthal rotation. The code allows describing the full optical features both in far- and near-field terms, and the performed analyses highlight the fundamental role of incident polarization on SPP excitation in the conical configuration.

Findings

Results of far-field polarization conversion and plasmonic near-field computation clearly show that azimuthally rotated metallic gratings can support propagating surface plasmon with generic polarization.

Originality/value

The recent papers experimentally demonstrated the benefits in sensitivity and the polarization phenomenology that are originated by an azimuthal rotation of the grating. In this work, numerical simulations confirm these experimental results and complete the analysis with a study of the excited SPP near-field on the metal surface.

Details

COMPEL: The International Journal for Computation and Mathematics in Electrical and Electronic Engineering, vol. 32 no. 6
Type: Research Article
ISSN: 0332-1649

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Article
Publication date: 6 June 2016

Sule Ugur, Merih Sarıışık, Gizem Türkoğlu, Gökhan Erkan and Emre Erden

The purpose of this paper is to create a textile material which shows antibacterial activity with resistance to environmental conditions by using volatile active agent…

Abstract

Purpose

The purpose of this paper is to create a textile material which shows antibacterial activity with resistance to environmental conditions by using volatile active agent inclusion complex and self-assembly method.

Design/methodology/approach

An inclusion complex of carvacrol and β-CD is generated by kneading method and deposited on the cotton fabrics by using a nanofabrication method named as layer-by-layer (LbL) deposition method. Three different concentration of CD and CD:Car aqueous solutions were deposited on cotton fabrics. Attenuated total reflectance Fourier transform infrared spectroscopy (FTIR-ATR), scanning electron microscopy (SEM), antimicrobial efficacy test of fabrics against washing and some physical tests (water vapor permeability, air permeability) were performed on the fabrics before and after the treatment with CD to evaluate the effect of the LbL process on cotton fabric properties.

Findings

The results showed that the coated fabrics with CD/CD:Car multilayer films enhanced the antimicrobial efficacy of cotton fabrics against to Klebsiella pneumonia and Staphylococus aureus bacteria. Air and water vapor permeability properties of the cotton fabric effected after the LbL deposition process sure enough. With SEM and FTIR-ATR analysis the CD:Car complex presence were verified. The durability of antibacterial properties were analyzed after one and ten washing (40°C and 30 min) cycles.

Originality/value

This work provides a novel and simple method for CD and inclusion complex of carvacrol film deposition by self-assembly method on cotton fabrics and their application onto cotton fabrics to gain antibacterial property.

Details

International Journal of Clothing Science and Technology, vol. 28 no. 3
Type: Research Article
ISSN: 0955-6222

Keywords

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Article
Publication date: 11 May 2010

Osvaldo J. Arenas, Emilie Leynia de la Jarrige and François Boone

The purpose of this paper is to share valuable information about low‐cost microwave circuit research with academic and industrial communities that work, or want to work…

Abstract

Purpose

The purpose of this paper is to share valuable information about low‐cost microwave circuit research with academic and industrial communities that work, or want to work, in this field.

Design/methodology/approach

Screen‐printing technology has been chosen as the fabrication method because of simplicity and low costs. Different materials and printing parameters were tested in four generations of microstrip lines. After obtaining a satisfactory fabrication method, passive microwave components were printed, assembled, characterized and modeled.

Findings

Results demonstrated that the proposed low‐cost method allows fabricating low loss microstrip lines (15.63×10−3 dB/mm at 10 GHz), filters, inductors, and capacitors that work well up to 12 GHz.

Research limitations/implications

Model accuracy of inductors and capacitors can be improved. The use of more precise calibration and de‐embedding techniques is necessary. More components can be fabricated and modeled to increase the flexibility and applicability of the proposed fabrication method.

Practical implications

The presented information can help limited budget companies and small educational institutions in electronics to fabricate microwave circuits at low costs. This is an excellent approach for students who want to learn how to make microwave frequency measurements and circuits without the need of expensive fabrication equipment and clean rooms.

Originality/value

The step‐by‐step fabrication method described in this paper allows fabricating different microwave components at low costs. The presentation of electrical models for each component completes the design‐fabrication cycle. As this information is gathered in a single source, it makes easier the incursion of new actors in the microwave field.

Details

Microelectronics International, vol. 27 no. 2
Type: Research Article
ISSN: 1356-5362

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Article
Publication date: 29 April 2014

Tijjani Adam and U. Hashim

The purpose of this study is to present reports on fabrication of silicon (Si) nanowires (NWs). The study consists of microwire formation on silicon-on-insulator (SOI…

Abstract

Purpose

The purpose of this study is to present reports on fabrication of silicon (Si) nanowires (NWs). The study consists of microwire formation on silicon-on-insulator (SOI) that was fabricated using a top-down approach which involved conventional photolithography coupled with shallow anisotropic etching.

Design/methodology/approach

A 5-inch p-type silicon-on-insulator (SOI) coated with 250nm layer and Photoresist (PR) with thickness of 400nm is coated in order to make pattern transfer via binary mask, after the exposure and development, a resist pattern between 3 μm-5 μm were obtained, Oxygen plasma spreen was used to reduce the size of the PR to 800 μm, after this, the wafer with 800 μm was loaded into SAMCO inductively coupled plasma (ICP)-RIE and got silicoon microwire was obtained. Next, the sample was put into an oxidation furnace for 15, 30, 45 and 60 minutes and the sample was removed and dipped into a buffered oxide etch solution for five minutes to remove all the SiO2 ashes.

Findings

The morphological characterization was conducted using scanning electron microscopy and atomic force microscopy. At terminal two, gold electrodes which were designated as source and drain were fabricated on top of individual NWs using conventional lithography electrical and chemical response. Once the trimming process has been completed, the device's current–voltage (I-V) characteristic was measured by using a Keithley 4200 semiconductor parameter analyser. Devices with different width of wires approximately 20, 40, 60 and 80 nm were characterized. The wire current variation as a function of the pH variation in voltage was investigated: pH monitoring for variations of pH values between 5 and 9.

Originality/value

This paper provides useful information on novel and yet simple cost-effective fabrication of SiNW; as such, it should be of interest to a broad readership, especially those interested in micro/nanofabrication.

Details

Microelectronics International, vol. 31 no. 2
Type: Research Article
ISSN: 1356-5362

Keywords

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