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The purpose of this paper is to report on a piezoresistive pressure sensor for micro-pressure measurement with a cross-beam membrane (CBM) structure. This study analyzes the dynamic characteristics of the proposed device.

This CBM sensor possesses high stiffness and sensitivity, measuring dynamic pressure more effectively in a high-frequency environment compared with other piezoresistive structures. The dynamic characteristics are derived using the finite element method to analyze the dynamic responses of the new structure, including natural frequency and lateral effect performances. The CBM dynamic performances are compared with traditional structures.

The pressure sensor performance was evaluated, and the experimental results indicate that they all exhibit similar dynamic characteristics as the designed model. Compared with traditional structures such as the single island, the CBM proves to be superior in evaluating the dynamic performances of pressure sensors at high frequencies of > 30 kHz.

Most studies of this micro pressure sensors attempt to promote the sensitivity or focus on the static performance of pressure sensor with micro gauge. This study is concerned with analyze the dynamic characterism of micro pressure sensor and compared with the traditional structures, that prove the CBM structure has stable dynamic performance and is a better option for measuring dynamic micro pressure in biomedical applications.

Considering its vast utility in industries, this paper aims to present a detailed review on fundamentals, classification and progresses in pressure sensors, along with its wide area of applications, its design aspects and challenges, to provide state-of-the-art gist to the researchers of the similar domain at one place.

Swiftly emerging research prospects in the micro-electro-mechanical system (MEMS) enable to build complex and sophisticated micro-structures on a substrate containing moving masses, cantilevers, flexures, levers, linkages, dampers, gears, detectors, actuators and many more on a single chip. One of the MEMS initial products that emerged into the micro-system technology is MEMS pressure sensor. Because of their high performance, low cost and compact in size, these sensors are extensively being adopted in numerous applications, namely, aerospace, automobile and bio-medical domain, etc. These application requirements drive and impose tremendous conditions on sensor design to overcome the tedious design and fabrication procedure before its reality. MEMS-based pressure sensors enable a wide range of pressure measurement as per the application requirements.

The paper provides a detailed review on fundamentals, classification and progresses in pressure sensors, along with its wide area of applications, its design aspects and challenges, to provide state of the art gist to the researchers of the similar domain at one place.

The present paper discusses the basics of MEMS pressure sensors, their working principles, different design aspects, classification, type of sensing diaphragm used and illustration of various transduction mechanisms. Moreover, this paper presents a comprehensive review on present trend of research on MEMS-based pressure sensors, its applications and the research gap observed till date along with the scope for future work, which has not been discussed in earlier reviews.

Pressure, being one of the key variables investigated in scientific and engineering research, requires critical and accurate measurement techniques. With the advancements in materials and machining technologies, there is a large leap in the measurement techniques including the development of micro electromechanical systems (MEMS) sensors. These sensors are one to two orders smaller in magnitude than traditional sensors and combine electrical and mechanical components that are fabricated using integrated circuit batch-processing technologies. MEMS are finding enormous applications in many industrial fields ranging from medical to automotive, communication to electronics, chemical to aviation and many more with a potential market of billions of dollars. MEMS pressure sensors are now widely used devices owing to their intrinsic properties of small size, light weight, low cost, ease of batch fabrication and integration with an electronic circuit. This paper aims to identify and analyze the common pressure sensing techniques and discuss their uses and advantages. As per our understanding, usage of MEMS pressure sensors in the aerospace industry is quite limited due to cost constraints and indirect measurement approaches owing to the inability to locate sensors in harsh environments. The purpose of this study is to summarize the published literature for application of MEMS pressure sensors in the said field. Five broad application areas have been investigated including: propulsion/turbomachinery applications, turbulent flow diagnosis, experimentalaerodynamics, micro-flow control and unmanned aerial vehicle (UAV)/micro aerial vehicle (MAV) applications.

The first part of the paper deals with an introduction to MEMS pressure sensors and mathematical relations for its fabrication. The second part covers pressure sensing principles followed by the application of MEMS pressure sensors in five major fields of aerospace industry.

In this paper, various pressure sensing principles in MEMS and applications of MEMS technology in the aerospace industry have been reviewed. Five application fields have been investigated including: Propulsion/Turbomachinery applications, turbulent flow diagnosis, experimental aerodynamics, micro-flow control and UAV/MAV applications. Applications of MEMS sensors in the aerospace industry are quite limited due to requirements of very high accuracy, high reliability and harsh environment survivability. However, the potential for growth of this technology is foreseen due to inherent features of MEMS sensors’ being light weight, low cost, ease of batch fabrication and capability of integration with electric circuits. All these advantages are very relevant to the aerospace industry. This work is an endeavor to present a comprehensive review of such MEMS pressure sensors, which are used in the aerospace industry and have been reported in recent literature.

As per the author’s understanding, usage of MEMS pressure sensors in the aerospace industry is quite limited due to cost constraints and indirect measurement approaches owing to the inability to locate sensors in harsh environments. Present work is a prime effort in summarizing the published literature for application of MEMS pressure sensors in the said field. Five broad application areas have been investigated including: propulsion/turbomachinery applications, turbulent flow diagnosis, experimental aerodynamics, micro-flow control and UAV/MAV applications.

The purpose of this paper is to investigate the disadvantages of traditional sensors and establish a new structure for pressure measurement.

A kind of novel piezoresistive micro‐pressure sensor with a cross‐beam membrane (CBM) structure is designed based on the silicon substrate. Through analyzing the stress distribution of the new structure by finite element method, the model of structure is established and compared with traditional structures. The fabrication is operated on silicon wafer, which applies the technology of anisotropy chemical etching and inductively coupled plasma.

Compared to the traditional C‐ and E‐type structures, this new CBM structure has the advantages of low nonlinearity and high sensitivities by the cross‐beam on the membrane, which cause the stress is more concentrated in sensitive area and the deflections that relate to the linearity are decreased.

The paper provides the first empirical reports on the new piezoresistive structure for the pressure measurement by fabricating a cross‐beam on the membrane and resolving the conflict of nonlinearity and sensitivity of the piezoresistive sensors.

The purpose of this paper is to describe the fabrication of a miniaturized membrane type double cavity vacuum‐sealed micro sensor for absolute pressure using front‐side lateral etching technology.

Potassium hydroxide‐based anisotropic etching of single crystal silicon is used to realize the cavities under the membrane type diaphragms through channels on the sides. The diaphragms consist of composite layers of plasma‐enhanced chemical vapour deposition (PECVD) of silicon nitride and silicon dioxide. PECVD of silicon dioxide is done for sealing the channels and the cavity in vacuum. Boron thermal diffusion in low‐pressure chemical vapour deposition of polysilicon layer over the membrane is done for realizing resistors. The fabricated device uses Wheatstone half bridge circuit to read the variation of resistance with respect to an applied pressure.

A double cavity vacuum‐sealed absolute pressure micro sensor has been fabricated successfully using front‐side lateral etching technology and has been measured for pressure range of 0‐0.45 MPa. The measured pressure sensitivity of two pressure sensors is 9.28 and 10.44 mV/MPa.

The paper shows that front‐side lateral etching technology is feasible in the fabrication of small vacuum‐sealed cavities and absolute pressure sensors.

Structures play a very important role in developing pressure sensors with good sensitivity and linearity, as they undergo deformation to the input pressure and function as the primary sensing element of the sensor. To achieve high sensitivity, thinner diaphragms are required; however, excessively thin diaphragms may induce large deflection and instability, leading to the unfavorable performances of a sensor in terms of linearity and repeatability. Thereby, importance is given to the development of innovative structures that offer good linearity and sensitivity. This paper aims to investigate the sensitivity of a bossed diaphragm coupled fixed guided beam three-dimensional (3D) structure for pressure sensor applications.

The proposed sensor comprises of mainly two sensing elements: the first being the 3D mechanical structure made of bulk silicon consisting of boss square diaphragm along with a fixed guided beam landing on to its center, forming the primary sensing element, and the diffused piezoresistors, which form the secondary sensing element, are embedded in the tensile and compression regions of the fixed guided beam. This micro mechanical 3 D structure is packaged for applying input pressure to the bottom of boss diaphragm. The sensor without pressure load has no deflection of the diaphragm; hence, no strain is observed on the fixed guided beam and also there is no change in the output voltage. When an input pressure P is applied through the pressure port, there is a deformation in the diaphragm causing a deflection, which displaces the mass and the fixed guided beam vertically, causing strain on the fixed guided beam, with tensile strain toward the guided end and compressive strain toward the fixed end of the close magnitudes. The geometrical dimensions of the structure, such as the diaphragm, boss and fixed guided beam, are optimized for linearity and maximum strain for an applied input pressure range of 0 to 10 bar. The structure is also analyzed analytically, numerically and experimentally, and the results are compared.

The structure offers equal magnitudes of tensile and compressive stresses on the surface of the fixed guided beam. It also offers good linearity and sensitivity. The analytical, simulation and experimental studies of this sensor are introduced and the results correlate with each other. Customized process steps are followed wherein two silicon-on-insulator (SOI) wafers are fusion bonded together, with SOI-1 wafer used to realize the diaphragm along with the boss and SOI-2 wafer to realize the fixed guided beam, leading to formation of a 3D structure. The geometrical dimensions of the structure, such as the diaphragm, boss and fixed guided beam, are optimized for linearity and maximum strain for an applied input pressure range of 0 to10 bar.

This paper presents a unique and compact 3D micro-mechanical structure pressure sensor with a rigid center square diaphragm (boss diaphragm) and a fixed guided beam landing at its center, with diffused piezoresistors embedded in the tensile and compression regions of the fixed guided beam. A total of six masks were involved to realize and fabricate the 3D structure and the sensor, which is presumed to be the first of its kind in the fabrication of MEMS-based piezoresistive pressure sensor.

The purpose of this study is to develop a piezoresistive absolute micro-pressure sensor for altimetry. For this application, both high sensitivity and high overload resistance are required. To develop a piezoresistive absolute micro-pressure sensor for altimetry, both high sensitivity and high-overload resistance are required. The structure design and optimization are critical for achieving the purpose. Besides, the study of dynamic performances is important for providing a solution to improve the accuracy under vibration environments.

An improved structure is studied through incorporating sensitive beams into the twin-island-diaphragm structure. Equations about surface stress and deflection of the sensor are established by multivariate fittings based on the ANSYS simulation results. Structure dimensions are determined by MATLAB optimization. The silicon bulk micromachining technology is utilized to fabricate the sensor prototype. The performances under both static and dynamic conditions are tested.

Compared with flat diaphragm and twin-island-diaphragm structures, the sensor features a relatively high sensitivity with the capacity of suffering atmosphere due to the introduction of sensitive beams and the optimization method used.

An improved sensor prototype is raised and optimized for achieving the high sensitivity and the capacity of suffering atmosphere simultaneously. A general optimization method is proposed based on the multivariate fitting results. To simplify the calculation, a method to linearize the nonlinear fitting and optimization problems is presented. Moreover, a differential readout scheme attempting to decrease the dynamic interference is designed.

The hands of intelligent robots perceive external stimuli and respond effectively according to tactile or pressure sensors. However, the traditional tactile and pressure sensors cannot perform human-skin-like intelligent properties of high sensitivity, large measurement range, multi-function and flexibility simultaneously. The purpose of this paper is to present a flexible tactile-pressure sensor based on hyper-elastics polydimethylsiloxane and plate capacitance.

With regard to this problem, this paper presents a flexible tactile-pressure sensor based on hyper-elastics PDMS and plate capacitance. The sensor has a size of 10 mm × 10 mm × 1.3 mm and is composed of four upper electrodes, one middle driving electrode and one lower electrode. The authors first analyzed the structure and the tactile-pressure sensing principle of human skin to obtain the design parameters of the sensor. Then they presented the working principle, material selection and mechanical structure design and fabrication process of the sensor. The authors also fabricated several sample devices of the sensor and carried out experiments to establish the relationship between the sensor output and the pressure.

The results show that the tactile part of the sensor can measure a range of 0.05-1N/mm² micro pressure with a sensitivity of 2.93 per cent/N and a linearity of 0.03 per cent. The pressure part of the sensor can measure a range of 1-30N/mm² pressure with a sensitivity of 0.08 per cent/N and a linearity of 0.07 per cent.

This paper analyzes the tactile and pressure sensing principles of human skin and develop an intelligent sensitive human-skin-like tactile-pressure sensor for intelligent robot perception systems. The sensor can achieve to imitate the tactile and pressure function simultaneously with a measurement resolution of 0.01 N and a spatial resolution of 2 mm.

Experts claim over 50% of sensor applications are currently served by silicon‐sensor technology.

The purpose of this paper is to use finite element method for optimizing the membrane type double cavity vacuum sealed structure for the best achievable sensitivity in a piezoresistive absolute pressure sensor and its validation using a standard complementary metal oxide semiconductor (CMOS) process.

A double cavity vacuum sealed piezoresistive absolute pressure sensor has been simulated and optimized for its performance and an analytical model describing the behaviour of the sensor has been described. The 1×1 mm sensor chip has two membrane type 100×30×1.7 μm diaphragms consisting of composite layers of plasma enhanced chemical vapour deposition (PECVD) of silicon nitride (Si₃N₄) and silicon dioxide (SiO₂) each hanging over 21 μm deep rectangular cavity. Potassium hydroxide (KOH) based anisotropic etching of single crystal silicon using front side lateral etching technology is used for the fabrication of the sensor. The electrical readout circuitry uses 318 Ω boron diffused low pressure vapour chemical vapour deposition (LPCVD) of polysilicon resistors arranged in the Wheatstone half bridge configuration. The sensing structure is simulated and optimized using COMSOL Multiphysics.

Front-side lateral etching technology has been successfully used for the fabrication of double cavity absolute pressure sensor. A good agreement with the fabricated device for the chosen location of the piezoresistors through simulation has been predicted. The measured pressure sensitivity of two tested pressure sensors is 12.63 and 12.46 mV/MPa, and simulated pressure sensitivity is found to be 12.9 mV/MPa for pressure range of 0 to 0.5 MPa. The location of the piezoresistor has also been optimized using the simulation tools for enhancing the sensor sensitivity to 62.14 mV/MPa. The pressure sensitivity is further enhanced to 92 mV/MPa by increasing the width of the diaphragm to 35 μm.

The simulated and measured pressure sensitivities of the double cavity pressure sensor are in close agreement. Sevenfold enhancement in the pressure sensitivity of the optimized sensing structure has been observed. The proposed front-side lateral etching technology can be adopted for making membrane type diaphragms hanging over vacuum sealed micro-cavities for high sensitivity pressure sensing applications.