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The purpose of this paper is the more exact evaluation of distorted constriction contact resistance between two clamped slabs or thin films, having a bi-dimensional current lines structure.

Mathematical modeling using conformal mappings.

The influence of the tarnish film on the distorted constriction resistance is clarified and three new exact formulas are proposed for the distorted constriction resistance between clamped slabs with rectangular contact spot. Comparisons with early proposed formula for constriction resistance of slab narrowing and with finite element analysis results are presented.

The research is limited to direct current and homogeneous and isotropic media and the results can be extended at alternate current when the skin effect is negligible.

Exact evaluation of 2D constriction contact resistance which appears in macro-scale contacts electrical equipment and in MEMS devices, particularly in crimp contacts.

The proposed formulas are new, original, simple and exact.