Keywords
Citation
Rigelsford, J. (2003), "Waveguide for plasma discharges", Sensor Review, Vol. 23 No. 1. https://doi.org/10.1108/sr.2003.08723aad.015
Publisher
:Emerald Group Publishing Limited
Copyright © 2003, MCB UP Limited
Waveguide for plasma discharges
Waveguide for plasma discharges
Applicant: Univ Tennessee Res Corp. (US)Patent number: US6,204,606Publication date: 20 March 2001Title: Slotted waveguide structure for generating plasma discharges
Keywords: Patents, Plasma discharge
The present invention relates to plasma discharges and in particular, to moderate-to-high-pressure non-equilibrium plasma discharges for materials processing applications.
The device uses a high voltage generated across a slot in the wall of a waveguide to generate a plasma. The slot interrupts currents in the wall of the waveguide and creates this high voltage. The slotted structure is useful for the production of long, narrow plasma discharges at moderate to high pressure. This type of discharge is suitable for the treatment of wide substrates such as films and webs.
Jon Rigelsford