Deep UV argon ion laser

Pigment & Resin Technology

ISSN: 0369-9420

Article publication date: 1 December 2004

Keywords

Citation

(2004), "Deep UV argon ion laser", Pigment & Resin Technology, Vol. 33 No. 6. https://doi.org/10.1108/prt.2004.12933fad.001

Publisher

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Emerald Group Publishing Limited

Copyright © 2004, Emerald Group Publishing Limited


Deep UV argon ion laser

Deep UV argon ion laser

Keywords: Lasers, Ultraviolet radiation

The new version of the proven Lexel 95-SHG frequency doubled argon ion laser offers high power output at deep UV wavelengths from 229 nm to 264 nm. Providing 200 mW of cw power at 257 nm, the improved design now offers a better beam profile with reduced astigmatism, faster warm-up time (15 min) and stability, and a UV-Vis quick switch option. Krypton ion versions are also available giving 284 nm.

Based on Lexel’s workhorse laser, the 95 series, the improvements only add to the flexibility and reliability of a laser that has been widely used in industry and research for nearly 30 years.

Also now available is the 85-SHG a more compact, economic, smaller brother to the 95, capable of running on standard single phase 240 V AC.

Both lasers are perfect for a wide variety of applications including UV raman spectroscopy, fibre Bragg grating writing, semiconductor photolithographic processing and defect detection, protein spectroscopy, interferometric optics testing, and capillary electrophoresis.