Atotech’s new semiconductor grade chemistry facility in Neuruppin, Germany

Microelectronics International

ISSN: 1356-5362

Article publication date: 20 January 2012



(2012), "Atotech’s new semiconductor grade chemistry facility in Neuruppin, Germany", Microelectronics International, Vol. 29 No. 1.



Emerald Group Publishing Limited

Copyright © 2012, Emerald Group Publishing Limited

Atotech’s new semiconductor grade chemistry facility in Neuruppin, Germany

Article Type: Industry news From: Microelectronics International, Volume 29, Issue 1

To meet the demands of the semiconductor industry, Atotech has enhanced its production capabilities by constructing a production plant dedicated to the manufacture of high purity chemistry. On Monday, September 12, 2011 Atotech celebrated the introduction of its new strategic semiconductor grade plating chemistry facility in Neuruppin, Germany.

The internal production qualification has been successfully completed and the facility is now ready for on-site customer qualifications. In addition to the introduction of the facility – its equipment and capabilities – we showcased our competitive advantage and provided an industry update on high purity chemistry in metallization technology solutions used for semiconductor and MEMS applications. In doing so, Atotech was able to both upgrade its existing production facilities and improve conventional methods of production to fully-automatic custom designed production.

Located 40 miles northwest of Atotech headquarters in Berlin, the new facility specializes in high purity and ultra high purity chemistry production, made possible by the use of selected and qualified raw materials and processes, closed systems, and class 1,000 mini-environments for filling. The plant itself has a production area of 700 m2 (7,500 ft2) with additional areas designated for ultra pure water generation, analytical equipment, and warehousing (see Figures 1 and 2).

State of the art semiconductor grade chemistry production

The production facility is designed to satisfy the high purity chemistry demands of the semiconductor industry by use of highly automated manufacturing methods and enclosed production environments. The newest engineering design techniques were used to ensure the manufacture of highest quality products while reducing chemical consumption and waste water in order to provide global, cost-effective process solutions. Production methods have been optimized to reduce contamination in the final product and allow for easy purging and cleaning. In addition to delivering these new capabilities, the facility raises the bar in terms of internal production quality and customer qualification standards, thereby presenting customers and end-markets with a true single advantage. The new facility sets new standards in chemistry manufacturing and provides us with a means of branching out from conventional methods of production to semi-automatic custom-designed production, while increasing annual production levels overall.

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