DEK shows next-generation solar metallization solutions at Shanghai

Microelectronics International

ISSN: 1356-5362

Article publication date: 31 July 2009



(2009), "DEK shows next-generation solar metallization solutions at Shanghai", Microelectronics International, Vol. 26 No. 3.



Emerald Group Publishing Limited

Copyright © 2009, Emerald Group Publishing Limited

DEK shows next-generation solar metallization solutions at Shanghai

Article Type: Industry news From: Microelectronics International, Volume 26, Issue 3

DEK was showing its next generation solar metallization line solutions at the SNEC PV Power Expo 2009 event in Pudong, Shanghai from 6 to 8 May. The screen printing specialist was previewing details of its latest high-throughput PV3000 silicon cell metallization concept and ran its state-of-the-art PV1200 metallization line live in Hall 6, Booth T621.

Visitors to the DEK booth at the SNEC event were able to watch a video of the PV3000, the company's latest innovation in crystalline silicon solar cell metallization that boosts throughput and productivity by using multiple print heads concurrently. In addition, the print heads themselves were on display.

The PV3000 promises consistently high rates of productivity to suit the escalating global demand for solar cells by combining DEK's expertise in exceptional print platform accuracy and repeatability with industry-leading process knowledge. To minimise breakage and waste, the new PV3000 system also features the same meticulous mechanical handling attributes as demonstrated at previous trade events on DEK's PV1200 line, which uses real 150 μm silicon wafers cycling continuously during the shows.

The PV1200 was also on display at SNEC, again cycling real c-Si wafers during live demonstrations on the booth. The PVP1200 screen printing platform is built using the precision expertise that has driven the DEK's established screen printing platforms proven in surface mount assembly and semiconductor packaging to achieve six-sigma process capability at a resolution of ±12.5 μm for maximum repeatability and advanced levels of accuracy. The platform also benefits from DEK's precision emulsion screen expertise, manufactured in-house under class 10,000 clean room conditions.

Special features include dedicated handling for thin wafers, ensuring low breakage rates for maximum yield, in addition to high-speed machine vision capabilities ensuring perfect alignment from the first wafer.

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