ASML, Zeiss and Canon cross-license lithography equipment patent portfolios

Microelectronics International

ISSN: 1356-5362

Article publication date: 18 April 2008

Citation

(2008), "ASML, Zeiss and Canon cross-license lithography equipment patent portfolios", Microelectronics International, Vol. 25 No. 2. https://doi.org/10.1108/mi.2008.21825bab.008

Publisher

:

Emerald Group Publishing Limited

Copyright © 2008, Emerald Group Publishing Limited


ASML, Zeiss and Canon cross-license lithography equipment patent portfolios

Article Type: Industry news From: Microelectronics International, Volume 25, Issue 2.

ASML Holding NV (ASML) and Carl Zeiss SMT (Zeiss) have each signed an agreement with Canon Inc. (Canon) for the global cross-license of patents in their respective fields of semiconductor lithography and optical components, used to manufacture integrated circuits, or chips.

ASML and Zeiss with their large current research and development efforts and resulting know-how, welcome this agreement with Canon, with its substantial patent portfolio. There will be no transfer of technology, which means ASML and Zeiss will continue to compete with all players in the market on the basis of their capability to bring leading technologies to market.

The cross-license helps the three companies to compete more freely in the area relevant to their customers, which is technology expertise and implementation, rather than on intellectual property (IP) rights. ASML and Zeiss are strongly committed to investing in research and development and will continue their build-up of know-how and IP.

The agreement means that the companies can market products based on technology covered by the other party's lithography equipment-related patents.