Advanced vapourisation system

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 April 2003

39

Keywords

Citation

(2003), "Advanced vapourisation system", Microelectronics International, Vol. 20 No. 1. https://doi.org/10.1108/mi.2003.21820aad.010

Publisher

:

Emerald Group Publishing Limited

Copyright © 2003, MCB UP Limited


Advanced vapourisation system

Advanced vapourisation system

Keywords: Vapourisation

The world’s most advanced vapourisation system for producing high quality vapour from liquid source chemicals used in CVD thin film deposition of semiconductor wafers and substrates has been introduced in Europe by Alliance Sales (Europe). MSP’s 2800 Vaporizer features patented vaporisation technology for producing high purity source chemical vapours.

Alliance Sales (Europe) will be responsible for sales and technical support of MSP’s 2800 system, which utilises advanced fine droplet atomisation technology to achieve rapid and complete drop vaporisation. The system achieves a high quality performance because there is no thermal decomposition and residue contaminant generation in the gas phase.

The 2800 features a large heat transfer area to produce high liquid/gas mass ratios and incorporates a three stage heating system to completely vaporise the liquid and eliminate fogging during pressure reduction.

Related articles