Keywords
Citation
(2003), "New versatile spin coater from SUSS MicroTec", Microelectronics International, Vol. 20 No. 1. https://doi.org/10.1108/mi.2003.21820aad.008
Publisher
:Emerald Group Publishing Limited
Copyright © 2003, MCB UP Limited
New versatile spin coater from SUSS MicroTec
New versatile spin coater from SUSS MicroTec
Keywords: SUSS MicroTec, Coatings
SUSS MicroTec has announced the Delta 80, a new Spin Coater that offers both the patented GYRSET™ system known from the former RC series, and conventional open bowl coating with high acceleration capabilities needed for some thin resist applications. The ability to coat thick resist also makes it the ideal tool for MEMS application technologies.
The GYRSET technology employs a closed processing chamber that creates a solvent saturated and turbulence-free atmosphere above the substrate. This technology is required for uniform coatings of rectangular substrates as well as for all fast drying photoresists. Uniformity is enhanced and cost savings of up to 60 per cent for resists like Cyclotene™ (BCB), a photosensitive polymer from the Dow Chemical Company, can be achieved compared to conventional spin coating equipment. The coater is part of the SUSS Delta Series that also includes process modules for drying, developing, etching, cleaning, vapour priming as well as hot and cool plates. The modular design allows a flexible equipment configuration, like the attachment of various process modules or customized subsystems. It is also possible to mount the modules into a wet bench or a stand- alone stainless steel cabinet.