Keywords
Citation
(2001), "Infineon Technologies extends its wide-ranging research collaboration with IMEC on basic technologies for next semiconductor generations", Microelectronics International, Vol. 18 No. 2. https://doi.org/10.1108/mi.2001.21818bab.014
Publisher
:Emerald Group Publishing Limited
Copyright © 2001, MCB UP Limited
Infineon Technologies extends its wide-ranging research collaboration with IMEC on basic technologies for next semiconductor generations
Infineon Technologies extends its wide-ranging research collaboration with IMEC on basic technologies for next semiconductor generations
Keywords Infineon Technologies, IMEC
Infineon Technologies has extended its collaboration with IMEC in the field of microelectronics technology and design- and system-oriented research.
Infineon, which has a longstanding relationship with IMEC, has joined several IMEC Industrial Affiliation Programs (IIAPs). The organizations will collaborate on advanced CMOS process steps and modules, which will focus on providing basic technologies for manufacture at dimensions of 70 nm or less, and advanced optical lithography. Additional joint activities cover System-on-Chip (SoC) design and Wireless LAN (WLANs) system applications.
The cooperation on process technology will address critical CMOS technology process developments. The research program on high-k gates aims to develop gate dielectrics and gate electrodes for (sub)-100nm devices. In a second program, research will be performed on interconnection technologies based on the use of low-k materials and Cu. Another part of the cooperation on process technology targets the optimization of silicide processing aspects and shallow junction formation for industrial processes. Finally, Infineon and IMEC will jointly develop optimized cleaning strategies and novel cleaning concepts.
The organizations also will collaborate in a joint lithography program which aims at extending the limit of optical lithography into the sub 100nm region. The program will focus on research of very deep UV-lithography processes with 157 optical wavelength.
Further details: Marianne Van den Broeck, IMEC. Tel: +32 1628 1491; Fax: +32 1628 1637; E-mail: marianne.vandenbroeck@imec.be