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TOPOGRAPHY SIMULATION IN PHOTOLITHOGRAPHY USING FINITE ELEMENT ANALYSIS AND A MODIFIED STRING ALGORITHM

K.I. Arshak (Microelectronics and Semiconductor Research Group, Department of Electronic and Computer Engineering, University of Limerick; Limerick, Ireland)
D. McDonagh (Microelectronics and Semiconductor Research Group, Department of Electronic and Computer Engineering, University of Limerick; Limerick, Ireland)
B.P. Mathur (Microelectronics and Semiconductor Research Group, Department of Electronic and Computer Engineering, University of Limerick; Limerick, Ireland)
A. Arshak (Microelectronics and Semiconductor Research Group, Department of Electronic and Computer Engineering, University of Limerick; Limerick, Ireland)

COMPEL - The international journal for computation and mathematics in electrical and electronic engineering

ISSN: 0332-1649

Article publication date: 1 April 1994

42

Abstract

In this paper, simulation of topography effects in photolithography is examined using the two‐dimensional PC based simulator called SLITS (Simulation of Lithography on Topographic Substrates). This program uses FEA software (in‐house written) to solve wave propagation in a photoresist layer and a modified String Algorithm for photoresist development. The simulated results illustrates the effect of topography on the latent and relief images.

Citation

Arshak, K.I., McDonagh, D., Mathur, B.P. and Arshak, A. (1994), "TOPOGRAPHY SIMULATION IN PHOTOLITHOGRAPHY USING FINITE ELEMENT ANALYSIS AND A MODIFIED STRING ALGORITHM", COMPEL - The international journal for computation and mathematics in electrical and electronic engineering, Vol. 13 No. 4, pp. 871-878. https://doi.org/10.1108/eb051902

Publisher

:

MCB UP Ltd

Copyright © 1994, MCB UP Limited

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