This paper describes a new two‐dimensional process simulation program MUSIC (MUltigrid Simulator for IC fabrication processes) which is prospective for the efficient IC process simulations due to its capability to eliminate strong bottlenecks present in the existing two‐dimensional process simulation programs. Multistep processes, including ion implantation, diffusion and oxidation, can be simulated, giving the doping profile. Robust and efficient adaptive multigrid numerical techniques for the simulation of coupled multiparticle diffusion processes are used. The capabilities of program MUSIC are illustrated by the results of the process flow simulation of a typical NMOS and bipolar transistors fabricated in BiCMOS technology.
Mijalković, S., Pantić, D., Prijić, Z., Mitrović, S. and Stojadinović, N. (1991), "MUSIC — A MULTIGRID SIMULATOR FOR IC FABRICATION PROCESSES", COMPEL - The international journal for computation and mathematics in electrical and electronic engineering, Vol. 10 No. 4, pp. 599-609. https://doi.org/10.1108/eb051734
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