To read this content please select one of the options below:

Improved Photoresist Technology Available in Europe

B.L. Newport (OMI International (GB) Ltd, Woking, Surrey, England)

Circuit World

ISSN: 0305-6120

Article publication date: 1 March 1988



Major trends in the PWB industry and the requirements from the manufacturers to reduce reject rates at the imaging and chemical process stages have demanded a new generation of dry film photoresists. Details are given of the requirements laid down by the industry, how the dry film resist manufacturers have responded, and how the improved resist technology meets these demands. These latest products are extensively available in Europe and resist improvements have been welcomed by the board manufacturers.


Newport, B.L. (1988), "Improved Photoresist Technology Available in Europe", Circuit World, Vol. 14 No. 4, pp. 21-22.




Copyright © 1988, MCB UP Limited

Related articles