Very Fine Line Photoimageable Thick Film Technology Developed at Hibridas

Abstract

The Microelectronics Division of the Radio Measurement Engineering Research Institute of Lithuania has developed a unique photoimageable thick film chemistry and process technology which has been in use since the mid‐1980s. The main application of the technology was for complex thick film microwave integrated circuits at lower cost than equivalent thin film devices. The paper describes the photoimageable materials and processing used at the Institute and also gives examples of suitable application in the microwave, high density interconnect, sensor and component fields.

Citation

Minalgiene, J., Baltrushaitis, V. and Muckett, S. (1994), "Very Fine Line Photoimageable Thick Film Technology Developed at Hibridas", Microelectronics International, Vol. 11 No. 2, pp. 25-30. https://doi.org/10.1108/eb044529