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Thick‐film Fine‐line Fabrication Techniques — Application to Front Metallisation of Solar Cells

A. Dziedzic (Institute of Electron Technology, Technical University of Wroclaw, Poland)
J. Nijs (Interuniversity Microelectronics Center (IMEC) Leuven, Leuven, Belgium)
J. Szlufcik (Interuniversity Microelectronics Center (IMEC) Leuven, Leuven, Belgium)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 January 1993

148

Abstract

Different techniques applied for the fabrication of thick‐film fine lines have been analysed. The basics, achievements, advantages and disadvantages of improved screen printing, screen printing with metal masks, the direct writing method, offset printing and photoformed or photoetched thick‐film are presented. In addition, current trends in front metallisation of silicon solar cells are described. Based on a critical review, the use of thick‐film fine lines for this purpose is discussed.

Citation

Dziedzic, A., Nijs, J. and Szlufcik, J. (1993), "Thick‐film Fine‐line Fabrication Techniques — Application to Front Metallisation of Solar Cells", Microelectronics International, Vol. 10 No. 1, pp. 18-26. https://doi.org/10.1108/eb044486

Publisher

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MCB UP Ltd

Copyright © 1993, MCB UP Limited

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