Application of Laser Technology in Drilling and Scribing Low Temperature Cofired Ceramic

Abstract

The new Low Temperature Cofired Ceramic process combines the advantages of thick film standard and cofired ceramic technologies for the implementation of high interconnection density hybrid circuits, at a reasonable cost. Due to the wide diversity of devices required in the telecommunications field, it is important to have for drilling and scribing a system capable of being easily integrated onto a LAN, in order to reduce the machine preparation time, using all the information already existing in CAD. As laser systems are standard in thick film production, the investments involved to implement a new technology are minimised. This paper describes the use of laser technology for drilling green ceramic to achieve interconnection paths between different levels, manufacturing of screen mask (via metallisation), and scribing of substrates already synthesised. A preliminary characterisation of Telettra's technology follows.

Citation

Tudanca, M., Gonzalez, R. and Ortega, N. (1990), "Application of Laser Technology in Drilling and Scribing Low Temperature Cofired Ceramic", Microelectronics International, Vol. 7 No. 1, pp. 10-14. https://doi.org/10.1108/eb044394