Photoconductivity of Thick Film Resistors
G.B. Parravicini
(Dipartimento di Fisica ‘A. Volta’, Pavia, Italy Unit ‘a’, GNSM‐CISM di Pavia and Modena, Italy)
G. Samoggia
(Dipartimento di Fisica ‘A. Volta’, Pavia, Italy Unit ‘a’, GNSM‐CISM di Pavia and Modena, Italy)
B. Morten
(Dipartimento di Fisica, Modena, Italy Unit ‘a’, GNSM‐CISM di Pavia and Modena, Italy)
M. Prudenziati
(Dipartimento di Fisica, Modena, Italy Unit ‘a’, GNSM‐CISM di Pavia and Modena, Italy)
19
Abstract
A weak change of resistivity caused by visible radiation both for commercial and for model thick‐film (cermet) resistors (TFRs) has been observed and studied in the temperature range 10–380 K. A possible origin of this photoelectric effect in terms of photoexcited electrons emitted from the metallic grain surface into the glassy region is discussed.
Citation
Parravicini, G.B., Samoggia, G., Morten, B. and Prudenziati, M. (1988), "Photoconductivity of Thick Film Resistors", Microelectronics International, Vol. 5 No. 3, pp. 17-19. https://doi.org/10.1108/eb044336
Publisher
:MCB UP Ltd
Copyright © 1988, MCB UP Limited