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Protective Thin Film Coatings by Plasma Polymerisation

R.K. Sadhir (Westinghouse R&D Center, Pittsburgh, Pennsylvania, USA)
H.E. Saunders (Westinghouse R&D Center, Pittsburgh, Pennsylvania, USA)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 January 1986

69

Abstract

The paper describes the plasma polymerisation process for depositing ultrathin films. Such films, deposited from monomers containing hydrophobic elements such as hexafluorobenzene and hexamethyldisiloxane, showed excellent water vapour barrier properties, due to dense, highly crosslinked and rigid structures of the films. The composition and structure of the plasma polymerised films have been elucidated by ESCA and infra‐red spectroscopy.

Citation

Sadhir, R.K. and Saunders, H.E. (1986), "Protective Thin Film Coatings by Plasma Polymerisation", Microelectronics International, Vol. 3 No. 1, pp. 28-32. https://doi.org/10.1108/eb044211

Publisher

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MCB UP Ltd

Copyright © 1986, MCB UP Limited

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