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Thin Film Technology for Prototypes and Small Scale Production—Equipment Needed, Experimental Results, Applications

S. Nørlyng (Brel & Kjaer, Naerum, Denmark)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 January 1986

53

Abstract

This paper gives a popular introduction to thin film and some reasons for using this technology. The miniaturisation techniques at Brel & Kjaer are described and the background for the work with thin film techniques is given. The company's method of realising thin film circuits is described by going through the resistor materials, resistor design and photolithography and etching steps. The kind of equipment needed and what B & K use to make prototypes and small scale production are shown. TCR‐values and the resistor stability after 10,000 hours at different environmental exposures are given. Examples of applications with single layer and double layer structures are shown. A thick film circuit is transformed to thin film, and the size reduction can be seen. Finally, for this circuit, the cost calculations are stated for both versions.

Citation

Nørlyng, S. (1986), "Thin Film Technology for Prototypes and Small Scale Production—Equipment Needed, Experimental Results, Applications", Microelectronics International, Vol. 3 No. 1, pp. 5-8. https://doi.org/10.1108/eb044205

Publisher

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MCB UP Ltd

Copyright © 1986, MCB UP Limited

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