AN EFFICIENT DIFFUSION ALGORITHM FOR 2‐D VLSI PROCESS MODELING CODE
ISSN: 0332-1649
Article publication date: 1 April 1990
Abstract
The coupled set of non‐linear 2D diffusion equations for donor and acceptor type impurities with initial and appropriated boundary conditions is solved by an implicit locally‐one dimensional finite difference method. Numerical experiments have been made to achieve a reasonable trade‐off between the desired accuracy and the CPU time. The algorithm was implemented to the process module of the 2‐D integrated process and device modeling system IMPEDANCE 2.0.
Citation
STEFANOV, E.N. and ASENOV, A.M. (1990), "AN EFFICIENT DIFFUSION ALGORITHM FOR 2‐D VLSI PROCESS MODELING CODE", COMPEL - The international journal for computation and mathematics in electrical and electronic engineering, Vol. 9 No. 4, pp. 229-245. https://doi.org/10.1108/eb010078
Publisher
:MCB UP Ltd
Copyright © 1990, MCB UP Limited