Emerald Group Publishing Limited
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Fast developing, robust liquid resist increases yield for volume production of fine line PCBs
Keywords Shipley Ronal, Liquid resists
Shipley Ronal is launching a new roller-coat photoimageable liquid resist, designed to help manufacturers achieve high yields in volume production of fine line PCBs. SN35R is highly durable, has a fast exposure time and is capable of producing fine line images.
Optimised for double-sided roller coating, SN35R is the first in a new generation of robust, flexible liquid resists from Shipley. In conjunction with individual yield improvement programmes designed for each installation, the new range offers manufacturers a low cost-of-ownership by significantly improving production yield.
Tested under production conditions, SN35R has been shown to be more resistant to mechanical damage than any competitive product tested. Boards can be stacked after drying, and after exposure, and can remain stacked for 48 hours or more without risk of damage. The resist is not tacky at expose, and is not damaged by automatic or manual handling.
With SN35R and the right equipment, exposure takes just two or three seconds. This 50 percent improvement in photospeed over previous generation liquid resist products helps speed production throughput.
A wide processing window makes SN35R a practical solution for manufacturing high volumes. It has excellent flow characteristics and has been shown to develop successfully line and space resolutions down to just five microns. SN35R is compatible with all conventional acid etchants - demonstrating excellent chemical resistance - and can be stripped easily with hydroxide-based solutions.
For further information: Chris Milton, Shipley Ronal. Tel: +44 (0)24 7665 4420; Fax: +44 (0)24 7665 4458; E-mail: firstname.lastname@example.org Rachel Redshaw, Shipley Ronal. Tel: +44 (0)24 7665 4400; Fax: +44(0) 24 7665 4458; E-mail: email@example.com