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Demonstrating existence of one suitable oxide phase concurrent with formation of Ti/p-Si Schottky junction by comparing direct calculation with analysis

Mehran Shahryari (Department of Physics, Payame Noor University, Tehran, Iran)
Mohammad Homayoon Shakib (Department of Physics Department, Islamic Azad University, Karaj Branch, Karaj, Iran)
Mohammad Bagher Askari (Department of Physics, Payame Noor University, Tehran, Iran)
Shahryar Nanekarani (Department of Physics, Faculty of Science, Islamic Azad University, Karaj Branch, Karaj, Iran)
Sanaz Saeidi Nejad (Department of Electronics Engineering, Science and Research University, Tehran, Iran)
Sedigheh Bagheri (Department of Chemistry, University of Isfahan, Isfahan, Iran)

World Journal of Engineering

ISSN: 1708-5284

Article publication date: 7 August 2017

Abstract

Purpose

The purpose of this paper is to demonstrate the existence of one suitable oxide phase concurrent with deposition for fabricating a titanium (Ti)/p-silicon (Si) Schottky diode by direct current (DC) magnetron sputtering method.

Design/methodology/approach

In this paper, a Ti/p-Si Schottky diode has been fabricated by depositing a Ti film on p-Si substrate by DC magnetron sputtering. Electrical properties of a Schottky junction include three main parameters: ideality factor (n), series resistance (Rs) and barrier height (Φb), which were determined by three analysis methods: current–voltage (I-V), Cheung function and Norde function.

Findings

As result outcomes of the calculated values by three analysis methods, average values were obtained equal to 2.475, 27.07 kÙ and 0.88 ev. With comparing direct calculation of series resistance with the achieved average value of three analysis methods, it illustrates that without X-ray diffraction (XRD) analysis consideration, it’s possible to deduce at least one oxide phase forming on the Ti layer.

Originality/value

This work fabricates Ti/p-Si Schottky diode by DC magnetron sputtering. By use of downward-arch region of the LnI-V curve, two functions that are known as Norde and Cheung were made with which this study applies these functions and linear region of LnI-V plot each values of n, Φb and Rs, except n calculated two times. With comparison of calculated values from two parts of plot, it is clear that Norde and Cheung functions are accurate and the applied method is correct. Also, with direct calculation, the value of Rs and as compared with result from analysis, this study has proved that without XRD plot, certainly simultaneity deposition at least one oxide phase was forming on Ti layer.

Keywords

Citation

Shahryari, M., Shakib, M.H., Askari, M.B., Nanekarani, S., Saeidi Nejad, S. and Bagheri, S. (2017), "Demonstrating existence of one suitable oxide phase concurrent with formation of Ti/p-Si Schottky junction by comparing direct calculation with analysis", World Journal of Engineering, Vol. 14 No. 4, pp. 284-288. https://doi.org/10.1108/WJE-07-2016-0022

Publisher

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Emerald Publishing Limited

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