To read this content please select one of the options below:

Structural and electrical study of BLT thin film deposited on different substrates by electron gun evaporation

B. Abdallah (Department of Physics, Atomic Energy Commission of Syria, Damascus, Syria)
F. Nasrallah (Department of Physics, Atomic Energy Commission of Syria, Damascus, Syria)
W. Tabbky (Department of Physics, Atomic Energy Commission of Syria, Damascus, Syria)

World Journal of Engineering

ISSN: 1708-5284

Article publication date: 5 July 2021

Issue publication date: 5 December 2022

36

Abstract

Purpose

The purpose of this study was to deposit Bi4Ti3O12 films by electron gun evaporation technique starting from Bi3.25La0.75Ti3O12 as a target without annealing. The films have been deposited on Si(100), on thin film buffer layer of Pt and glass substrates. X-ray diffraction (XRD) was used to analyze structure of the films, which possesses a good structure with (0010) preferred orientation. Electronic behavior of the samples has been studied.

Design/methodology/approach

The dependence of both the structure and quality of the BLT thin films on different substrates is studied using XRD. The electrical characteristics were determined using capacitance–voltage (C–V) and current–voltage (I–V) measurements at the frequency of 1 MHz. Optical properties of the grown films deposited on glass substrates were characterized by optical transmittance measurements (UV-Vis).

Findings

The XRD analysis approved the crystallographer structure of the prepared Bi4Ti3O12 films. The optical properties of deposited film (transmittance and the band gap value) are extracted by UV-Vis spectrum.

Originality/value

High crystalline quality Bi4Ti3O12 films have been obtained using different substrates at room temperature by means of electron gun deposition. The electrical and ferroelectric properties of thin films were studied using I–V and C–V measurements. The band gap has been found to be about 3.62 eV for the studied film deposited on glass substrate. Electron beam evaporation technique is the most interesting methods, once considering many advantages; such as its stability, reproducibility, high deposition rate and the compositions of the films are controlled.

Keywords

Acknowledgements

The authors would like to thank Prof I. Othman, the Director General of the AEC of Syria, for his important support and Dr S. Haddad and M.D. Zidan for useful discussion.

Citation

Abdallah, B., Nasrallah, F. and Tabbky, W. (2022), "Structural and electrical study of BLT thin film deposited on different substrates by electron gun evaporation", World Journal of Engineering, Vol. 19 No. 6, pp. 788-793. https://doi.org/10.1108/WJE-06-2020-0200

Publisher

:

Emerald Publishing Limited

Copyright © 2021, Emerald Publishing Limited

Related articles