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Synthesis of Bi2WO6/g-C3N4 photocatalyst and high degradation of Rhodamine B under visible light irradiation

Wenjie Wang (School of Chemical Engineering, NorthWest University, Shaanxi, Xi’an, China)
Mengran Zhang (School of Urban Planning and Municipal Engineering, Xi’an Polytechnic University, Xi’an, China)
Binxia Zhao (School of Chemical Engineering, NorthWest University, Shaanxi, Xi’an, China)
Linxue Liu (School of Chemical Engineering, NorthWest University, Shaanxi, Xi’an, China)
Ruixuan Han (School of Chemical Engineering, NorthWest University, Shaanxi, Xi’an, China)
Nan Wang (School of Chemical Engineering, NorthWest University, Shaanxi, Xi’an, China)

Pigment & Resin Technology

ISSN: 0369-9420

Article publication date: 8 March 2021

Issue publication date: 3 January 2022

265

Abstract

Purpose

The purpose of this paper is to improve the degradation efficiency of Rhodamine B (RhB) by new photocatalytic materials.

Design/methodology/approach

Binary Z-scheme g-C3N4/Bi2WO6 photocatalytic material was synthesized by the one-step hydrothermal reaction. The construction of Z-scheme heterojunction led to the rapid separation of photogenerated electrons and holes, which would degrade RhB into small molecular substances to achieve the purpose of degradation.

Findings

It was found that Bi2WO6/25%g-C3N4 displayed the highest photocatalytic activity, which was about 1.44 and 1.34 times higher than that of pure Bi2WO6 and g-C3N4, respectively. According to the trapping experiments, the superoxide radical (·O2−) was the major active species of the RhB decomposition in Bi2WO6/g-C3N4 catalysts.

Originality/value

The successful synthesis of Z-scheme Bi2WO6/g-C3N4 provides new ideas and references for the design of catalysts with high photocatalytic activity, which should have wide applications in the future.

Keywords

Citation

Wang, W., Zhang, M., Zhao, B., Liu, L., Han, R. and Wang, N. (2022), "Synthesis of Bi2WO6/g-C3N4 photocatalyst and high degradation of Rhodamine B under visible light irradiation", Pigment & Resin Technology, Vol. 51 No. 1, pp. 91-100. https://doi.org/10.1108/PRT-09-2020-0097

Publisher

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Emerald Publishing Limited

Copyright © 2021, Emerald Publishing Limited

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