Improving wafer handling performance in semiconductor manufacturing

Abstract

Purpose

The electronics industries are relying increasingly on robotics for their production. Wafer handling robots are used to transfer wafers between wafer processing stations. A pick‐measure‐place method is typically utilized to transfer wafers accurately. The measurement step is performed using an aligner, which is time‐consuming. To increase wafer transfer efficiency, it is desirable to speed up the measurement process or place it in parallel with other operations. To solve the problem, optic sensors are installed at each station to estimate the wafer eccentricity on‐the‐fly. The eccentricity values are then applied to control the robot to place the wafer directly onto another station accurately without using the aligner. However, current methods face problems to achieve high accuracy requirements to meet the electronic manufacturing needs. The purpose of this paper is to develop a technique to improve the wafer handling performance in semiconductor manufacturing.

Design/methodology/approach

The kinematics model of the wafer handling robot is developed. Two sensor location calibration algorithms are proposed. Method I is based on the wafer handling path. Method II uses the offset paths from the wafer handling path. The results from these two methods are compared. To compute the wafer eccentricity on‐the‐fly, a wafer eccentricity estimation technique is developed.

Findings

The developed methods are implemented using a wafer handling robotic system in semiconductor manufacturing. The wafer eccentricity estimation errors are greatly reduced using the developed methods. The experimental results demonstrate that Method II achieves better results and can be used to improve the wafer handling accuracy and efficiency.

Research limitations/implications

The proposed technique is implemented and tested many times on a wafer handing robotic system. The notch alignment in the wafer handling needs further research.

Practical implications

The developed method is validated using a system in semiconductor manufacturing. Hence the developed method can be directly implemented in production if the notch of a wafer can be identified.

Originality/value

This paper provides techniques to improve the wafer handling accuracy in semiconductor manufacturing. Compared with the results using other methods, Method II greatly increases the wafer handling accuracy to satisfy the semiconductor manufacturing needs.

Citation

Chen, H., Cheng, H. and Mooring, B. (2013), "Improving wafer handling performance in semiconductor manufacturing", Industrial Robot, Vol. 40 No. 5, pp. 425-432. https://doi.org/10.1108/IR-09-2012-414