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Design and fabrication of silicon condenser microphone using single deeply corrugated diaphragm technique

W.J. Wang (Centre for Mechanics of Micro‐Systems, School of Mechanical and Production Engineering, Nanyang Technological University, Singapore)
R.M. Lin (Centre for Mechanics of Micro‐Systems, School of Mechanical and Production Engineering, Nanyang Technological University, Singapore)
Y. Ren (Tissue Engineering Lab, School of Mechanical and Production Engineering, Nanyang Technological University, Singapore)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 December 2003

743

Abstract

A single wafer silicon condenser microphone with a novel single deeply corrugated diaphragm is presented in this paper. The microphone diaphragm with corrugation depth of 100 μm is only 1 mm2 in area, while the open‐circuit sensitivity as high as 9.8 mV/Pa under a bias voltage of 6 V has been obtained. The recorded frequency bandwidth is about 20 kHz. The measurements show reasonable agreements with the theoretical predictions.

Keywords

Citation

Wang, W.J., Lin, R.M. and Ren, Y. (2003), "Design and fabrication of silicon condenser microphone using single deeply corrugated diaphragm technique", Microelectronics International, Vol. 20 No. 3, pp. 36-40. https://doi.org/10.1108/13565360310487936

Publisher

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MCB UP Ltd

Copyright © 2003, MCB UP Limited

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