An automatic garment pattern generation system has been developed for the three‐dimensional apparel CAD system. To substitute the garment fitting process, which requires lots of trial and error in the traditional pattern generation methods, we developed a new direct pattern generation method using body‐garment shape matching process. In this method, we first generated a body model using three‐dimensionally measured anthropometric data and transformed it to have a convex shape similar to that of a commonly used dummy model in garment design process. Then a typical garment model has been defined by measuring the surface information of a dummy model using stereoscopy and adjusting its shape considering the geometrical constraints of the underlying body model to obtain the optimum fit garment patterns. Finally, we developed a pattern flattening algorithm that flattens the three‐dimensionally adjusted garment model into two‐dimensional patterns considering the anisotropic properties of the fabric to be used.
Jin Kang, T. and Min Kim, S. (2000), "Optimized garment pattern generation based on three‐dimensional anthropometric measurement", International Journal of Clothing Science and Technology, Vol. 12 No. 4, pp. 240-254. https://doi.org/10.1108/09556220010373043Download as .RIS
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