Enhanced solder wettability of oxidized‐copper with lead‐free solder via Ar‐H2 plasmas for flip‐chip bumping: the effects of H2 flow rates

Abstract

Purpose

The purpose of this paper is to investigate the effects of H2 flow rate on improving the solder wettability of oxidized‐copper with liquid lead‐free solder (96.5Sn‐3Ag‐0.5Cu) by Ar‐H2 plasmas. The aim was to improve the solder wettability of oxidized copper from 0 per cent wetting of copper oxidized in air at 260^oC for 1 hour to 100 per cent wetting of oxidized‐copper modified by Ar‐H2 plasmas at certain H2 flow rates and to find correlations between the surface characteristics of copper and the solder wettability with liquid lead‐free solder.

Design/methodology/approach

To reduce the copper oxides on the surfaces of oxidized‐copper for improving solder wettability with liquid lead‐free solder, this study attempted to apply Ar‐H2 plasmas to ablate the copper oxides from the surfaces of oxidized‐copper by the physical bombardment of the Ar plasmas and to reduce the surfaces of oxidized‐copper by the chemical reaction of H2 plasmas with the surfaces of oxidized‐copper.

Findings

The solder wettability of oxidized‐copper was found to be highly dependent on the surface characteristics of the copper. The values of polar surface free energy and dispersive surface free energy on the surfaces of oxidized‐copper modified by Ar‐H2 plasmas were close to those values of solid lead‐free solder, which resulted in improved solder wettability with liquid lead‐free solder. Auger spectra indicated that the Ar‐H2 plasma modification was used to remove the copper oxides from the surfaces of oxidized‐copper.

Originality/value

The surface characterization of copper surfaces is typically determined by expensive surface analysis tool such as Auger Electron Spectroscopy (AES). This paper reports the results of a study of a promising technique called the sessile drop test method, for examining the surface free energies such as total surface free energy, polar surface free energy and dispersive surface free energy on the surfaces of copper to clarify how the solder wettability of oxidized‐copper with liquid lead‐free solder was enhanced by Ar‐H2 plasmas.

Citation

Lin, Y.S., Lin, W.J. and Chiu, L.Y. (2012), "Enhanced solder wettability of oxidized‐copper with lead‐free solder via Ar‐H2 plasmas for flip‐chip bumping: the effects of H2 flow rates", Soldering & Surface Mount Technology, Vol. 24 No. 3, pp. 183-190. https://doi.org/10.1108/09540911211240047