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Triazolic compounds as corrosion inhibitors for copper in hydrochloric acid

S. El Issami (Laboratoire de Chimie‐Physique, Equipe de Chimie Moléculaire et Corrosion, Faculté des Sciences, Agadir, Morocco)
L. Bazzi (Laboratoire de Chimie‐Physique, Equipe de Chimie Moléculaire et Corrosion, Faculté des Sciences, Agadir, Morocco)
M. Mihit (Laboratoire de Chimie‐Physique, Equipe de Chimie Moléculaire et Corrosion, Faculté des Sciences, Agadir, Morocco)
B. Hammouti (Laboratoire de Chimie des Eaux et Corrosion, Faculté des Sciences, Oujda, Morocco)
S. Kertit (Ecole Supérieure d'Optique Appliquée, Rabat, Morocco)
E. Ait Addi (laboratoire de l'Etablissement Autonome de Contrôle et de Coordination des Exportations, Agadir, Morocco)
R. Salghi (Ecole Nationale des Sciences, Appliquées d' Agadir, Agadir, Morocco)

Pigment & Resin Technology

ISSN: 0369-9420

Article publication date: 29 May 2007

645

Abstract

Purpose

To correlate the inhibitory effect of triazole compounds on the corrosion of copper in HCl at various temperatures by semi‐empirical molecular orbital theory.

Design/methodology/approach

Two triazoles were selected as the best inhibitors among the triazole compounds tested. Gravimetric and electrochemical measurements were conducted.

Findings

Correlation between inhibition efficiency and calculation of molecular orbital of triazole compounds was obtained. Cu(I)‐triazole complex formation was confirmed by UV spectroscopy.

Research limitations/implications

The calculation of energetic levels of molecular orbital may be a tool to explain the classification of inhibitor efficiency.

Practical implications

The theoretical calculation is a complementary mean to selecting an efficient inhibitor among a given series. Good agreement between the experimental methods explored and theoretical calculations was observed.

Originality/value

The originality of this work was the finding of the correlation between energetic levels of orbital molecular and inhibitor efficiency of triazole compounds. The confirmation of the formation of Cu(I)‐triazole by UV‐visible spectroscopy was also new.

Keywords

Citation

El Issami, S., Bazzi, L., Mihit, M., Hammouti, B., Kertit, S., Ait Addi, E. and Salghi, R. (2007), "Triazolic compounds as corrosion inhibitors for copper in hydrochloric acid", Pigment & Resin Technology, Vol. 36 No. 3, pp. 161-168. https://doi.org/10.1108/03699420710749027

Publisher

:

Emerald Group Publishing Limited

Copyright © 2007, Emerald Group Publishing Limited

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