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Direct immersion gold (DIG) as a final finish

Shigeo Hashimoto (C. Uyemura and Corporation Ltd, Central Research Laboratory, Osaka, Japan)
Masayuki Kiso (C. Uyemura and Corporation Ltd, Central Research Laboratory, Osaka, Japan)
Yukinori Oda (C. Uyemura and Corporation Ltd, Central Research Laboratory, Osaka, Japan)
Horoshi Otake (C. Uyemura and Corporation Ltd, Central Research Laboratory, Osaka, Japan)
George Milad (UIC Technical Center, Southington, Connecticut, USA)
Don Gudaczauskas (UIC Technical Center, Southington, Connecticut, USA)

Circuit World

ISSN: 0305-6120

Article publication date: 1 January 2006

555

Abstract

Purpose

To report on research on the alternative surface finish “direct gold on copper”, including reaction mechanism, methods of deposition and end uses.

Design/methodology/approach

Examines the deposition reaction of the electroless flash gold plating bath, and the effects of the copper surface roughness and deposition time on the deposit and solderability characteristics.

Findings

Direct immersion gold is only partially immersion and mostly electroless in deposition mode. The surface is applicable to soldering for both leaded solder and lead‐free solders. The surface is also wire bondable.

Originality/value

The paper offers details of a new alternative surface finish for use in printed circuit board fabrication as well as in packaging applications. The paper shows the electroless deposition mode of the process. The finish is ideally suited where Rf losses must be minimized. It is suitable for soldering as well as for wire bonding.

Keywords

Citation

Hashimoto, S., Kiso, M., Oda, Y., Otake, H., Milad, G. and Gudaczauskas, D. (2006), "Direct immersion gold (DIG) as a final finish", Circuit World, Vol. 32 No. 1, pp. 16-22. https://doi.org/10.1108/03056120610616517

Publisher

:

Emerald Group Publishing Limited

Copyright © 2006, Emerald Group Publishing Limited

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